Zirconium tungstate (ZrW₂O₈)-based micromachined negative thermal-expansion thin films

Keyphrases

• Micromachining 100%
• ZrW2O8 100%
• Negative Thermal Expansion 100%
• Zirconium Tungstate 100%
• Evaporated Films 40%
• Microstructure 20%
• Low Density 20%
• Stoichiometry 20%
• Bulk Material 20%
• Deposition Conditions 20%
• Physical Mechanism 20%
• Coefficient of Thermal Expansion 20%
• Mechanical Device 20%
• Bulk Crystal 20%
• Electron Beam Evaporation 20%
• Expansion Media 20%
• Thermally Sensitive 20%
• Thermal Expansion Behavior 20%
• Sputtered Films 20%
• Reactive Co-sputtering 20%
• Negative Thermal Expansion Materials 20%

Material Science

• Zirconium 100%
• Tungstate 100%
• Negative Thermal Expansion 100%
• Thin Films 100%
• Film 66%
• Density 33%
• Thermal Expansion 16%
• Sputtered Film 16%

Engineering

• Thin Films 100%
• Bulk Material 16%
• Coefficient of Thermal Expansion 16%
• Bulk Crystal 16%
• Deposition Condition 16%
• Electron-Beam Evaporation 16%
• Reaction Stoichiometry 16%