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X-ray lithography processing at CXrL from beamline to quarter-micron NMOS devices
Ramez Nachman, Gong Chen, Michael T. Reilly, Gregory M. Wells, John P. Wallace, Hsin H. Li, Azalia A. Krasnoperova, Paul D. Anderson, Eric Brodsky, Eti Ganin, Stephen A. Campbell, James W. Taylor, Franco Cerrina
Research output: Chapter in Book/Report/Conference proceeding › Conference contribution
1
Scopus
citations