X-ray lithography processing at CXrL from beamline to quarter-micron NMOS devices

Ramez Nachman, Gong Chen, Michael T. Reilly, Gregory M. Wells, John P. Wallace, Hsin H. Li, Azalia A. Krasnoperova, Paul D. Anderson, Eric Brodsky, Eti Ganin, Stephen A. Campbell, James W. Taylor, Franco Cerrina

Research output: Chapter in Book/Report/Conference proceedingConference contribution

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