X-ray diffraction from anodic TiO2 films: in situ and ex situ comparison of the Ti (0001) face

David G. Wiesler, Michael F. Toney, Owen R. Melroy, Christopher S. McMillan, William H. Smyrl

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Abstract

X-ray diffraction with synchrotron radiation is used to study the structure and epitaxy of a thin (~ 250 Å) anodic film grown slowly on the basal plane of single-crystal Ti. Anatase crystallites, roughly 130 Å in diameter, are observed, with no indication of other forms of TiO2 or films with lower oxidation state. The oxide is more orientationally disordered than films grown on the (1120) and (1010) faces of Ti, but it exhibits weak six- and twelve-fold texturing by the metal sublayer. In situ and ex situ measurements are qualitatively similar, suggesting that the oxide does not change appreciably upon emersion.

Original languageEnglish (US)
Pages (from-to)341-349
Number of pages9
JournalSurface Science
Volume302
Issue number3
DOIs
StatePublished - Feb 1 1994

Bibliographical note

Funding Information:
We acknowledgeJo e Gordon and Mahesh Samantf or helpful discussionsS. pecialt hanks go to Jean Jordan-Sweeat nd RenCH oladayf or their assistancea t NSLS and to Hugh Isaacs for lendingu s his SCE referencee lectrodeT. his work was supportedb y DOE under grantD E-FG02-88ER 45338.T he X-ray measurements were performeda t NSLS, which is supported by the US Departmento f Energy,D ivision of Material Sciencesa nd Division of Chemical Sciences.

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