X-ray diffraction from anodic TiO2 films: in situ and ex situ comparison of the Ti (0001) face

David G. Wiesler, Michael F. Toney, Owen R. Melroy, Christopher S. McMillan, William H. Smyrl

Research output: Contribution to journalArticlepeer-review

9 Scopus citations


X-ray diffraction with synchrotron radiation is used to study the structure and epitaxy of a thin (~ 250 Å) anodic film grown slowly on the basal plane of single-crystal Ti. Anatase crystallites, roughly 130 Å in diameter, are observed, with no indication of other forms of TiO2 or films with lower oxidation state. The oxide is more orientationally disordered than films grown on the (1120) and (1010) faces of Ti, but it exhibits weak six- and twelve-fold texturing by the metal sublayer. In situ and ex situ measurements are qualitatively similar, suggesting that the oxide does not change appreciably upon emersion.

Original languageEnglish (US)
Pages (from-to)341-349
Number of pages9
JournalSurface Science
Issue number3
StatePublished - Feb 1 1994

Fingerprint Dive into the research topics of 'X-ray diffraction from anodic TiO<sub>2</sub> films: in situ and ex situ comparison of the Ti (0001) face'. Together they form a unique fingerprint.

Cite this