Wettability Contrast Gravure Printing

Heng Zhang; Alexander Ramm; Sooman Lim; Wei Xie; Bok Yeop Ahn; WeiChao Xu; Ankit Mahajan; Wieslaw J. Suszynski; Chris Kim; Jennifer A. Lewis; C. Daniel Frisbie; Lorraine F. Francis

doi:10.1002/adma.201502639

Wettability Contrast Gravure Printing

Heng Zhang, Alexander Ramm, Sooman Lim, Wei Xie, Bok Yeop Ahn, WeiChao Xu, Ankit Mahajan, Wieslaw J. Suszynski, Chris Kim, Jennifer A. Lewis, C. Daniel Frisbie, Lorraine F. Francis

Research output: Contribution to journal › Article › peer-review

22 Scopus citations

Abstract

Silicon gravure patterns are engineered to have cells that are wettable and lands that are not wettable by aqueous inks. This strategy allows excess ink on the lands to be removed without using a doctor blade. Using an aqueous silica ink, continuous lines as narrow as 1.2 μm with 1.5 μm space are gravure printed.

Original language	English (US)
Pages (from-to)	7420-7425
Number of pages	6
Journal	Advanced Materials
Volume	27
Issue number	45
DOIs	https://doi.org/10.1002/adma.201502639
State	Published - Dec 2 2015

Bibliographical note

Publisher Copyright:
© 2015 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.

Keywords

flexible electronics
gravure printing
nanoparticle inks
printing
wettability contrast

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10.1002/adma.201502639

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title = "Wettability Contrast Gravure Printing",

abstract = "Silicon gravure patterns are engineered to have cells that are wettable and lands that are not wettable by aqueous inks. This strategy allows excess ink on the lands to be removed without using a doctor blade. Using an aqueous silica ink, continuous lines as narrow as 1.2 μm with 1.5 μm space are gravure printed.",

keywords = "flexible electronics, gravure printing, nanoparticle inks, printing, wettability contrast",

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doi = "10.1002/adma.201502639",

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T1 - Wettability Contrast Gravure Printing

AU - Zhang, Heng

AU - Ramm, Alexander

AU - Lim, Sooman

AU - Xie, Wei

AU - Ahn, Bok Yeop

AU - Xu, WeiChao

AU - Mahajan, Ankit

AU - Suszynski, Wieslaw J.

AU - Kim, Chris

AU - Lewis, Jennifer A.

AU - Frisbie, C. Daniel

AU - Francis, Lorraine F.

PY - 2015/12/2

Y1 - 2015/12/2

N2 - Silicon gravure patterns are engineered to have cells that are wettable and lands that are not wettable by aqueous inks. This strategy allows excess ink on the lands to be removed without using a doctor blade. Using an aqueous silica ink, continuous lines as narrow as 1.2 μm with 1.5 μm space are gravure printed.

AB - Silicon gravure patterns are engineered to have cells that are wettable and lands that are not wettable by aqueous inks. This strategy allows excess ink on the lands to be removed without using a doctor blade. Using an aqueous silica ink, continuous lines as narrow as 1.2 μm with 1.5 μm space are gravure printed.

KW - flexible electronics

KW - gravure printing

KW - nanoparticle inks

KW - printing

KW - wettability contrast

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JO - Advanced Materials

JF - Advanced Materials

IS - 45

ER -

Wettability Contrast Gravure Printing

Abstract

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