Wettability Contrast Gravure Printing

Heng Zhang, Alexander Ramm, Sooman Lim, Wei Xie, Bok Yeop Ahn, WeiChao Xu, Ankit Mahajan, Wieslaw J. Suszynski, Chris Kim, Jennifer A. Lewis, C. Daniel Frisbie, Lorraine F. Francis

Research output: Contribution to journalArticlepeer-review

22 Scopus citations


Silicon gravure patterns are engineered to have cells that are wettable and lands that are not wettable by aqueous inks. This strategy allows excess ink on the lands to be removed without using a doctor blade. Using an aqueous silica ink, continuous lines as narrow as 1.2 μm with 1.5 μm space are gravure printed.

Original languageEnglish (US)
Pages (from-to)7420-7425
Number of pages6
JournalAdvanced Materials
Issue number45
StatePublished - Dec 2 2015

Bibliographical note

Publisher Copyright:
© 2015 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.


  • flexible electronics
  • gravure printing
  • nanoparticle inks
  • printing
  • wettability contrast


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