Well-Ordered Nanoporous ABA Copolymer Thin Films via Solvent Vapor Annealing, Homopolymer Blending, and Selective Etching of ABAC Tetrablock Terpolymers

Keyphrases

• Nanoporous 100%
• Solvent Vapor Annealing 100%
• Tetrablock 100%
• Terpolymer 100%
• Homopolymer 100%
• Selective Etching 100%
• Well-ordered 100%
• Copolymer Thin Film 100%
• Polystyrene 66%
• Nanostructures 33%
• Polylactide 33%
• Triblock 33%
• Mixed Solvent 33%
• Acetone 33%
• Film Thickness 33%
• Basic Hydrolysis 33%
• Reactive Ion Etching 33%
• Range Limits 33%
• Tetrahydrofuran 33%
• Nanoporosity 33%
• Scanning Electron Microscope Image 33%
• Polyisoprene 33%
• Tapping Mode Atomic Force Microscopy 33%
• Annealing Treatment 33%
• Scanning Electron Microscopy Analysis 33%
• Film Surface Morphology 33%
• Solvent Environment 33%
• Film Matrices 33%

Material Science

• Copolymer 100%
• Thin Films 100%
• Scanning Electron Microscopy 66%
• Polystyrene 66%
• Film 33%
• Film Thickness 33%
• Annealing 33%
• Reactive Ion Etching 33%
• Electron Microscopy 33%
• Atomic Force Microscopy 33%
• Surface Morphology 33%
• Enzymatic Hydrolysis 33%
• Nanostructure 33%
• Cylinder 33%

Pharmacology, Toxicology and Pharmaceutical Science

• Styrofoam 100%
• Scanning Electron Microscopy 100%
• Copolymer 100%
• Electron Microscopy 50%
• Mixed Solvent 50%
• Polylactide 50%
• Tetrahydrofuran 50%
• Atomic Force Microscopy 50%
• Acetone 50%
• Nanomaterial 50%