Vertically oriented sub-10-nm plasmonic nanogap arrays

Keyphrases

• Aluminum Oxide 50%
• Atomic Layer Deposition 50%
• Collective Excitations 50%
• Conduction Electrons 50%
• Electromagnetic Energy 50%
• Fabrication Methods 50%
• Gap Size 100%
• High Density 50%
• High-throughput Fabrication 50%
• Light-matter Interaction 50%
• Local Surface 50%
• Metal Cans 50%
• Metal Structure 50%
• Nanogap 100%
• Nanogap Arrays 100%
• Nanometric 100%
• Nanophotonics 50%
• Noble Metals 50%
• Optical Lithography 50%
• Plasmonic Nanogap 100%
• Precision Control 50%
• Sacrificial Layer 50%
• Size Reduction 50%
• Stimulated Raman Scattering 50%
• Sub-10 Nm 100%
• Sub-10-nm Gaps 50%
• Subwavelength Localization 50%
• Surface Plasmon 50%
• Surface-enhanced Raman Scattering 100%
• Ultrathin 50%
• Vertically Oriented 100%
• Wafer 50%

Material Science

• Aluminum Oxide 50%
• Density 50%
• Lithography 50%
• Surface Plasmons 50%
• Surface-Enhanced Raman Spectroscopy 100%