Vapor Processes

Research output: Chapter in Book/Report/Conference proceedingChapter

Abstract

The three most common vapor processes are described, including sputtering, evaporation, and chemical vapor deposition. These processes are used primarily to make thin films and nanostructures. First, the kinetic theory of gases is used to show how vacuums control vapor processes. Next, the origin of typical thin film microstructures is discussed. The chapter then details the three processes, including parameters that most affect the resulting materials and ends with examples of subtractive and additive postprocessing.

Original languageEnglish (US)
Title of host publicationMaterials Processing
Subtitle of host publicationa Unified Approach to Processing of Metals, Ceramics, and Polymers
PublisherElsevier
Pages549-629
Number of pages81
ISBN (Electronic)9780128239087
ISBN (Print)9780128239094
DOIs
StatePublished - Jan 1 2024

Bibliographical note

Publisher Copyright:
© 2024 Elsevier Inc. All rights are reserved including those for text and data mining AI training and similar technologies.

Keywords

  • Chemical vapor deposition
  • Evaporation
  • Nanostructures
  • Sputtering
  • Thin films
  • Vacuum

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