Vapor Processes

Research output: Chapter in Book/Report/Conference proceedingChapter

Abstract

The three most common vapor processes are described, including sputtering, evaporation, and chemical vapor deposition. These processes are used primarily to make thin films and nanostructures. First, the kinetic theory of gases is used to show how vacuums control vapor processes. Next, the origin of typical thin film microstructures is discussed. The chapter then details the three processes, including parameters that most affect the resulting materials.

Original languageEnglish (US)
Title of host publicationMaterials Processing
Subtitle of host publicationA Unified Approach to Processing of Metals, Ceramics and Polymers
PublisherElsevier
Pages513-588
Number of pages76
ISBN (Electronic)9780123851321
ISBN (Print)9780123851338
DOIs
StatePublished - Jan 1 2016

Bibliographical note

Publisher Copyright:
© 2016 Elsevier Inc. All rights reserved.

Keywords

  • Chemical vapor deposition
  • Evaporation
  • Nanostructures
  • Sputtering
  • Thin films
  • Vacuum

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