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Understanding of hydrogen silsesquioxane electron resist for sub- 5-nm-half-pitch lithography
Joel K.W. Yang, Bryan Cord, Huigao Duan, Karl K. Berggren, Joseph Klingfus, Sung Wook Nam, Ki Bum Kim, Michael J. Rooks
Research output: Contribution to journal › Article › peer-review
157
Scopus
citations