Uncovering the transformations that occur during the early stages of TiO2 CVD on Si (A perspective on the article, "tiO2 chemical vapor deposition on Si(111) in ultrahigh vacuum: Transition from interfacial phase to crystalline phase in the reaction limited regime" by A. Sandell et al.)

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Abstract

This perspective offers a brief summary of a series of publications that reveal insight into the nucleation of titanium oxide on different surfaces.

Original languageEnglish (US)
Number of pages1
JournalSurface Science
Volume605
Issue number13-14
DOIs
StatePublished - Jul 2011

Keywords

  • Chemical vapor deposition
  • Polycrystalline thin films
  • Synchrotron radiation photoelectron spectroscopy
  • Titanium oxide

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