Ultraviolet-sensitive, visible-blind GaN photodiodes fabricated by molecular beam epitaxy

J. M. Van Hove, R. Hickman, J. J. Klaassen, P. P. Chow, P P Ruden

Research output: Contribution to journalArticlepeer-review

154 Scopus citations

Abstract

GaN p-i-n photovoltaic diode arrays were fabricated from epitaxial films deposited on sapphire by molecular beam epitaxy. Peak UV responsivity was 0.11 A/W at 360 nm, corresponding to 48% internal quantum efficiency. Visible rejection over 400-800 nm was 3-4 orders of magnitude. Typical pulsed time response was measured at 8.2 μs. Spectral response modeling was performed to analyze the photocurrent contributions from photogenerated carrier drift in the depletion region and from minority carrier diffusion in the p and n layers. With the model, a maximum internal quantum efficiency of 55% at 360 nm was calculated for the photovoltaic diode structure.

Original languageEnglish (US)
Pages (from-to)2282-2284
Number of pages3
JournalApplied Physics Letters
Volume70
Issue number17
DOIs
StatePublished - Apr 28 1997

Fingerprint Dive into the research topics of 'Ultraviolet-sensitive, visible-blind GaN photodiodes fabricated by molecular beam epitaxy'. Together they form a unique fingerprint.

Cite this