Ultrasmooth Polydopamine Modified Surfaces for Block Copolymer Nanopatterning on Flexible Substrates

Joon Hee Cho, Reika Katsumata, Sunshine X. Zhou, Chae Bin Kim, Austin R. Dulaney, Dustin W. Janes, Christopher J. Ellison

Research output: Contribution to journalArticlepeer-review

25 Scopus citations

Abstract

Nature has engineered universal, catechol-containing adhesives which can be synthetically mimicked in the form of polydopamine (PDA). In this study, PDA was exploited to enable the formation of block copolymer (BCP) nanopatterns on a variety of soft material surfaces. While conventional PDA coating times (1 h) produce a layer too rough for most applications of BCP nanopatterning, we found that these substrates could be polished by bath sonication in a weakly basic solution to form a conformal, smooth (root-mean-square roughness ∼0.4 nm), and thin (3 nm) layer free of large prominent granules. This chemically functionalized, biomimetic layer served as a reactive platform for subsequently grafting a surface neutral layer of poly(styrene-random-methyl methacrylate-random-glycidyl methacrylate) to perpendicularly orient lamellae-forming poly(styrene-block-methyl methacrylate) BCP. Moreover, scanning electron microscopy observations confirmed that a BCP nanopattern on a poly(ethylene terephthalate) substrate was not affected by bending with a radius of ∼0.5 cm. This procedure enables nondestructive, plasma-free surface modification of chemically inert, low-surface energy soft materials, thus overcoming many current chemical and physical limitations that may impede high-throughput, roll-to-roll nanomanufacturing.

Original languageEnglish (US)
Pages (from-to)7456-7463
Number of pages8
JournalACS Applied Materials and Interfaces
Volume8
Issue number11
DOIs
StatePublished - Mar 30 2016
Externally publishedYes

Bibliographical note

Publisher Copyright:
© 2016 American Chemical Society.

Keywords

  • block copolymer (BCP)
  • conformal coating
  • flexible substrates
  • nanopatterning
  • polydopamine (PDA)
  • self-assembly
  • solution deposition
  • surface modification

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