We demonstrate integrated nano-optomechanical systems with driven flexural resonance up to 760 MHz in the ultrahigh frequency band. The mechanical element of the device is embedded in a slot waveguide racetrack optical resonator with an optical quality factor of 60 000. Displacement sensitivity of 0.45× 10-15 m/ Hz at 127 MHz is achieved in this circuit cavity configuration.
Bibliographical noteFunding Information:
We are grateful to Michael Rooks for his help with the ebeam lithography, and Michael Power for helping with direct write optical lithography. We acknowledge funding support from DARPA/MTO ORCHID program through a grant from AFOSR Grant No. FA9550-10-1-0297 and National Science Foundation CAREER award. W.H.P.P. acknowledges support from the Alexander von Humboldt postdoctoral fellowship program. H.X.T. acknowledges support from a Packard Fellowship in Science and Engineering and a career award from National Science Foundation. Ebeam lithography was carried out at the Center for Functional Nanomaterials, Brookhaven National Laboratory, which is supported by the U.S. Department of Energy, Office of Basic Energy Sciences, under Contract No. DE-AC02-98CH10886.