Tuning the permeability of permalloy films for on-chip inductor applications

Tawab Dastagir; Wei Xu; Saurabh Sinha; Hao Wu; Yu Cao; Hongbin Yu

doi:10.1063/1.3502478

Tuning the permeability of permalloy films for on-chip inductor applications

Tawab Dastagir, Wei Xu, Saurabh Sinha, Hao Wu, Yu Cao, Hongbin Yu

Research output: Contribution to journal › Article › peer-review

70 Scopus citations

Abstract

In this work, we demonstrate that the permeability of 1 μm thick NiFe/Cr multilayer films can be tuned by varying the thickness of individual NiFe layers while keeping the total multilayer film thickness constant. Our results show that the permeability can be increased from 170 to 650 by varying the NiFe thicknesses from 100 to 50 nm. The thickness dependant permeability variation was attributed to the presence of stripe domains, as examined by hysteresis measurements and magnetic force microscope imaging. Films with thinner NiFe layers coupled with on-chip spiral inductors enable an inductance increase by a factor of 6.

Original language	English (US)
Article number	162506
Journal	Applied Physics Letters
Volume	97
Issue number	16
DOIs	https://doi.org/10.1063/1.3502478
State	Published - Oct 18 2010
Externally published	Yes

Bibliographical note

Funding Information:
H. Yu and Y. Cao acknowledge the support from NSF Grant No. 0727100. We thank R. Chamberlin and C. Tracy for helpful discussions and reading of the manuscript.

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abstract = "In this work, we demonstrate that the permeability of 1 μm thick NiFe/Cr multilayer films can be tuned by varying the thickness of individual NiFe layers while keeping the total multilayer film thickness constant. Our results show that the permeability can be increased from 170 to 650 by varying the NiFe thicknesses from 100 to 50 nm. The thickness dependant permeability variation was attributed to the presence of stripe domains, as examined by hysteresis measurements and magnetic force microscope imaging. Films with thinner NiFe layers coupled with on-chip spiral inductors enable an inductance increase by a factor of 6.",

author = "Tawab Dastagir and Wei Xu and Saurabh Sinha and Hao Wu and Yu Cao and Hongbin Yu",

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T1 - Tuning the permeability of permalloy films for on-chip inductor applications

AU - Dastagir, Tawab

AU - Xu, Wei

AU - Sinha, Saurabh

AU - Wu, Hao

AU - Cao, Yu

AU - Yu, Hongbin

N1 - Funding Information: H. Yu and Y. Cao acknowledge the support from NSF Grant No. 0727100. We thank R. Chamberlin and C. Tracy for helpful discussions and reading of the manuscript.

PY - 2010/10/18

Y1 - 2010/10/18

N2 - In this work, we demonstrate that the permeability of 1 μm thick NiFe/Cr multilayer films can be tuned by varying the thickness of individual NiFe layers while keeping the total multilayer film thickness constant. Our results show that the permeability can be increased from 170 to 650 by varying the NiFe thicknesses from 100 to 50 nm. The thickness dependant permeability variation was attributed to the presence of stripe domains, as examined by hysteresis measurements and magnetic force microscope imaging. Films with thinner NiFe layers coupled with on-chip spiral inductors enable an inductance increase by a factor of 6.

AB - In this work, we demonstrate that the permeability of 1 μm thick NiFe/Cr multilayer films can be tuned by varying the thickness of individual NiFe layers while keeping the total multilayer film thickness constant. Our results show that the permeability can be increased from 170 to 650 by varying the NiFe thicknesses from 100 to 50 nm. The thickness dependant permeability variation was attributed to the presence of stripe domains, as examined by hysteresis measurements and magnetic force microscope imaging. Films with thinner NiFe layers coupled with on-chip spiral inductors enable an inductance increase by a factor of 6.

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Tuning the permeability of permalloy films for on-chip inductor applications

Abstract

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