Abstract
Extreme Ultraviolet (EUV) Lithography constitutes a crucial advance in semiconductor manufacturing, marking a shift to nanoelectronics. EUV lithography machines utilize light sources at 13.5 nm wavelength to achieve a finer resolution of the printed features. Such a short wavelength of light is currently generated by laser-produced tin microdroplet plasmas. This paper presents progress in building a Thomson scattering system to probe the dynamics of electron properties in these laser-produced plasmas. A droplet generator system is built and commissioned. We demonstrate time-resolved Thomson scattering measurements of the electron feature in argon at atmospheric pressure. Both collective and non-collective Thomson scattering spectra are observed.
| Original language | English (US) |
|---|---|
| Title of host publication | AIAA SciTech Forum and Exposition, 2024 |
| Publisher | American Institute of Aeronautics and Astronautics Inc, AIAA |
| ISBN (Print) | 9781624107115 |
| DOIs | |
| State | Published - 2024 |
| Event | AIAA SciTech Forum and Exposition, 2024 - Orlando, United States Duration: Jan 8 2024 → Jan 12 2024 |
Publication series
| Name | AIAA SciTech Forum and Exposition, 2024 |
|---|
Conference
| Conference | AIAA SciTech Forum and Exposition, 2024 |
|---|---|
| Country/Territory | United States |
| City | Orlando |
| Period | 1/8/24 → 1/12/24 |
Bibliographical note
Publisher Copyright:© 2024 by Ji Yung Ahn, Jianan Wang, Tasnim Akbar Faruquee, Grayson LaCombe, and Marien Simeni Simeni. Published by the American Institute of Aeronautics and Astronautics, Inc., with permission.
UN SDGs
This output contributes to the following UN Sustainable Development Goals (SDGs)
-
SDG 9 Industry, Innovation, and Infrastructure
Fingerprint
Dive into the research topics of 'Toward Thomson Scattering Measurements of Electron Properties of Laser-Produced Extreme Ultraviolet Plasma Light Sources'. Together they form a unique fingerprint.Cite this
- APA
- Standard
- Harvard
- Vancouver
- Author
- BIBTEX
- RIS