Keyphrases
Block Copolymer
100%
Lactide
100%
Sub-10 Nm
100%
Thin Film Self-assembly
100%
PS-b-PMMA
50%
Small Domains
50%
Self-assembly
25%
Glass Transition
25%
Semiconductor Devices
25%
Order of Magnitude
25%
Polystyrene
25%
Interaction Parameter
25%
Reactive Ion Etching
25%
Diblock
25%
Dimethylsilane
25%
Trimethylsilyl Group
25%
Lithography Process
25%
Block Copolymer Self-assembly
25%
Above Room Temperature
25%
Styrene Monomer
25%
Etching Rate
25%
Magnetic Storage Media
25%
Large Segment
25%
Poly-α-methylstyrene
25%
As(V)
25%
PS-b-PDMS
25%
Segment Interaction
25%
Material Science
Block Copolymer
100%
Thin Films
100%
Self Assembly
100%
Polystyrene
40%
Poly Methyl Methacrylate
40%
Lithography
20%
Glass Transition
20%
Semiconductor Device
20%
Cylinder
20%
Methyl Methacrylate
20%
Methacrylic Acid Methyl Ester
20%
Pharmacology, Toxicology and Pharmaceutical Science
Copolymer
100%
Styrofoam
40%
Styrene
20%
Monomer
20%
Methacrylic Acid Methyl Ester
20%