THIN FILM RESONATOR TECHNOLOGY.

K. M. Lakin; G. R. Kline; R. S. Ketcham; A. R. Landin; W. A. Burkland; K. T. McCarron; S. D. Braymen; S. G. Burns

doi:10.1109/freq.1987.201049

THIN FILM RESONATOR TECHNOLOGY.

K. M. Lakin
, G. R. Kline
, R. S. Ketcham
, A. R. Landin
, W. A. Burkland
, K. T. McCarron
, S. D. Braymen
, S. G. Burns

Electrical Engineering

Research output: Contribution to journal › Conference article › peer-review

34 Scopus citations

Abstract

An overview is presented of the development of thin-film-resonator (TFR)-based technology, including a discussion of materials, materials processing, and device physics. High-Q trapped energy resonators, low-insertion loss filters, and an integrated oscillator have been demonstrated and are reported. The future of TFR technology in the area of application-specific ICs as applied to communications, telemetry, sensors, and other high-frequency systems is examined.

Original language	English (US)
Pages (from-to)	371-381
Number of pages	11
Journal	Proceedings of the Annual IEEE International Frequency Control Symposium
DOIs	https://doi.org/10.1109/freq.1987.201049
State	Published - 1987

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10.1109/freq.1987.201049

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title = "THIN FILM RESONATOR TECHNOLOGY.",

abstract = "An overview is presented of the development of thin-film-resonator (TFR)-based technology, including a discussion of materials, materials processing, and device physics. High-Q trapped energy resonators, low-insertion loss filters, and an integrated oscillator have been demonstrated and are reported. The future of TFR technology in the area of application-specific ICs as applied to communications, telemetry, sensors, and other high-frequency systems is examined.",

author = "Lakin, \{K. M.\} and Kline, \{G. R.\} and Ketcham, \{R. S.\} and Landin, \{A. R.\} and Burkland, \{W. A.\} and McCarron, \{K. T.\} and Braymen, \{S. D.\} and Burns, \{S. G.\}",

year = "1987",

doi = "10.1109/freq.1987.201049",

language = "English (US)",

pages = "371--381",

journal = "Proceedings of the Annual IEEE International Frequency Control Symposium",

issn = "0161-6404",

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T1 - THIN FILM RESONATOR TECHNOLOGY.

AU - Lakin, K. M.

AU - Kline, G. R.

AU - Ketcham, R. S.

AU - Landin, A. R.

AU - Burkland, W. A.

AU - McCarron, K. T.

AU - Braymen, S. D.

AU - Burns, S. G.

PY - 1987

Y1 - 1987

N2 - An overview is presented of the development of thin-film-resonator (TFR)-based technology, including a discussion of materials, materials processing, and device physics. High-Q trapped energy resonators, low-insertion loss filters, and an integrated oscillator have been demonstrated and are reported. The future of TFR technology in the area of application-specific ICs as applied to communications, telemetry, sensors, and other high-frequency systems is examined.

AB - An overview is presented of the development of thin-film-resonator (TFR)-based technology, including a discussion of materials, materials processing, and device physics. High-Q trapped energy resonators, low-insertion loss filters, and an integrated oscillator have been demonstrated and are reported. The future of TFR technology in the area of application-specific ICs as applied to communications, telemetry, sensors, and other high-frequency systems is examined.

UR - https://www.scopus.com/pages/publications/0023562325

UR - https://www.scopus.com/pages/publications/0023562325#tab=citedBy

U2 - 10.1109/freq.1987.201049

DO - 10.1109/freq.1987.201049

M3 - Conference article

AN - SCOPUS:0023562325

SN - 0161-6404

SP - 371

EP - 381

JO - Proceedings of the Annual IEEE International Frequency Control Symposium

JF - Proceedings of the Annual IEEE International Frequency Control Symposium

ER -

THIN FILM RESONATOR TECHNOLOGY.

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