THIN FILM RESONATOR TECHNOLOGY.

K. M. Lakin, G. R. Kline, R. S. Ketcham, A. R. Landin, W. A. Burkland, K. T. McCarron, S. D. Braymen, S. G. Burns

Research output: Contribution to journalConference articlepeer-review

31 Scopus citations

Abstract

An overview is presented of the development of thin-film-resonator (TFR)-based technology, including a discussion of materials, materials processing, and device physics. High-Q trapped energy resonators, low-insertion loss filters, and an integrated oscillator have been demonstrated and are reported. The future of TFR technology in the area of application-specific ICs as applied to communications, telemetry, sensors, and other high-frequency systems is examined.

Original languageEnglish (US)
Pages (from-to)371-381
Number of pages11
JournalProceedings of the Annual IEEE International Frequency Control Symposium
DOIs
StatePublished - 1987

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