Thin film deposition of an n-type organic semiconductor by ink-jet printing technique

Yuming Ai, Yi Liu, Tianhong Cui, Kody Varahramyan

Research output: Contribution to journalArticlepeer-review

18 Scopus citations

Abstract

An n-type organic material, 1,4,5,8-naphthalene-tetracarboxylic dianhydride (NTCDA), was successfully deposited and patterned on a SiO 2/Si wafer by the ink-jet printing technique. Dimethylformamide (DMF) was selected as the solvent in the processing of the ink-jet solution, NTCDA. After thermal annealing, the NTCDA thin film showed higher conductivity than the NTCDA thin film deposited by vacuum sublimation. Degradation of conductivity with time was found when the thin film was open to an ambient atmosphere.

Original languageEnglish (US)
Pages (from-to)312-315
Number of pages4
JournalThin Solid Films
Volume450
Issue number2
DOIs
StatePublished - Mar 1 2004

Bibliographical note

Funding Information:
This work is partially supported by the DARPA DAAD19-02-1-0338 grant and the CEnIT seed grant at Louisiana Tech University.

Keywords

  • Conductivity
  • Ink-jet printing
  • Solution processing
  • n-type polymer

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