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Thermal plasma deposition of nanostructured films
A. Neuman
, J. Blum
, N. Tymiak
, Z. Wong
, N. P. Rao
, W. Gerberich
, P. H. McMurry
, J. V.R. Heberlein
, S. L. Girshick
Chemical Engineering and Materials Science
Mechanical Engineering
Research output
:
Contribution to journal
›
Article
›
peer-review
5
Scopus citations
Overview
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Keyphrases
Plasma Deposition
100%
Thermal Plasma
100%
Nanostructured Films
100%
Nanoparticles
33%
Thermal Plasma Process
33%
Nozzle
33%
Nanoparticle Synthesis
33%
Particle Deposition
33%
Nucleate
33%
Nanostructured Silicon
33%
Plasma Flow
33%
Plasma Particles
33%
Hypersonic Plasma
33%
Silicon Carbide Film
33%
Physics
Thermal Plasma
100%
Nanoparticle
66%
Plasma Process
33%
Hypersonics
33%
Magnetohydrodynamic Flow
33%
Silicon Carbide
33%
Blood Flow
33%
Material Science
Film
100%
Plasma Deposition
100%
Nanoparticle
40%
Silicon Carbide
20%