Thermal plasma deposition of nanostructured films

A. Neuman; J. Blum; N. Tymiak; Z. Wong; N. P. Rao; W. Gerberich; P. H. McMurry; J. V.R. Heberlein; S. L. Girshick

doi:10.1109/27.763025

Thermal plasma deposition of nanostructured films

A. Neuman, J. Blum, N. Tymiak, Z. Wong, N. P. Rao, W. Gerberich, P. H. McMurry, J. V.R. Heberlein, S. L. Girshick

Research output: Contribution to journal › Article › peer-review

5 Scopus citations

Abstract

A thermal plasma process for the synthesis of nanoparticles and their immediate assembly into nanostructured films is discussed. In this process, known as hypersonic plasma particle deposition, a thermal plasma with injected precursors is expanded through a nozzle to nucleate nanoparticles, which are then inertially deposited onto a cooled substrate in vacuum. A lightly consolidated nanostructured film results. Particle and film diagnostics along with images of the plasma flow are used to explain the formation of nanostructured silicon carbide films by this process.

Original language	English (US)
Pages (from-to)	46-47
Number of pages	2
Journal	IEEE Transactions on Plasma Science
Volume	27
Issue number	1
DOIs	https://doi.org/10.1109/27.763025
State	Published - 1999

Bibliographical note

Funding Information:
Manuscript received June 26, 1998; revised October 21, 1998. This work was supported by NSF (CTS-9520147, ECD-87-21545) and the Minnesota Supercomputer Institute.

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title = "Thermal plasma deposition of nanostructured films",

abstract = "A thermal plasma process for the synthesis of nanoparticles and their immediate assembly into nanostructured films is discussed. In this process, known as hypersonic plasma particle deposition, a thermal plasma with injected precursors is expanded through a nozzle to nucleate nanoparticles, which are then inertially deposited onto a cooled substrate in vacuum. A lightly consolidated nanostructured film results. Particle and film diagnostics along with images of the plasma flow are used to explain the formation of nanostructured silicon carbide films by this process.",

author = "A. Neuman and J. Blum and N. Tymiak and Z. Wong and Rao, \{N. P.\} and W. Gerberich and McMurry, \{P. H.\} and Heberlein, \{J. V.R.\} and Girshick, \{S. L.\}",

note = "Funding Information: Manuscript received June 26, 1998; revised October 21, 1998. This work was supported by NSF (CTS-9520147, ECD-87-21545) and the Minnesota Supercomputer Institute.",

year = "1999",

doi = "10.1109/27.763025",

language = "English (US)",

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TY - JOUR

T1 - Thermal plasma deposition of nanostructured films

AU - Neuman, A.

AU - Blum, J.

AU - Tymiak, N.

AU - Wong, Z.

AU - Rao, N. P.

AU - Gerberich, W.

AU - McMurry, P. H.

AU - Heberlein, J. V.R.

AU - Girshick, S. L.

N1 - Funding Information: Manuscript received June 26, 1998; revised October 21, 1998. This work was supported by NSF (CTS-9520147, ECD-87-21545) and the Minnesota Supercomputer Institute.

PY - 1999

Y1 - 1999

N2 - A thermal plasma process for the synthesis of nanoparticles and their immediate assembly into nanostructured films is discussed. In this process, known as hypersonic plasma particle deposition, a thermal plasma with injected precursors is expanded through a nozzle to nucleate nanoparticles, which are then inertially deposited onto a cooled substrate in vacuum. A lightly consolidated nanostructured film results. Particle and film diagnostics along with images of the plasma flow are used to explain the formation of nanostructured silicon carbide films by this process.

AB - A thermal plasma process for the synthesis of nanoparticles and their immediate assembly into nanostructured films is discussed. In this process, known as hypersonic plasma particle deposition, a thermal plasma with injected precursors is expanded through a nozzle to nucleate nanoparticles, which are then inertially deposited onto a cooled substrate in vacuum. A lightly consolidated nanostructured film results. Particle and film diagnostics along with images of the plasma flow are used to explain the formation of nanostructured silicon carbide films by this process.

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DO - 10.1109/27.763025

M3 - Article

AN - SCOPUS:0032626764

SN - 0093-3813

VL - 27

SP - 46

EP - 47

JO - IEEE Transactions on Plasma Science

JF - IEEE Transactions on Plasma Science

IS - 1

ER -

Thermal plasma deposition of nanostructured films

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