Thermal plasma deposition of nanostructured films

A. Neuman, J. Blum, N. Tymiak, Z. Wong, N. P. Rao, W. Gerberich, P. H. McMurry, J. V.R. Heberlein, S. L. Girshick

Research output: Contribution to journalArticlepeer-review

5 Scopus citations

Abstract

A thermal plasma process for the synthesis of nanoparticles and their immediate assembly into nanostructured films is discussed. In this process, known as hypersonic plasma particle deposition, a thermal plasma with injected precursors is expanded through a nozzle to nucleate nanoparticles, which are then inertially deposited onto a cooled substrate in vacuum. A lightly consolidated nanostructured film results. Particle and film diagnostics along with images of the plasma flow are used to explain the formation of nanostructured silicon carbide films by this process.

Original languageEnglish (US)
Pages (from-to)46-47
Number of pages2
JournalIEEE Transactions on Plasma Science
Volume27
Issue number1
DOIs
StatePublished - 1999

Bibliographical note

Funding Information:
Manuscript received June 26, 1998; revised October 21, 1998. This work was supported by NSF (CTS-9520147, ECD-87-21545) and the Minnesota Supercomputer Institute.

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