The use of aluminum and gallium hydrides in materials science

Jolin A. Jegier, Wayne L. Gladfelter

Research output: Contribution to journalReview articlepeer-review

64 Scopus citations


The use of aluminum and gallium hydrides as molecular precursors has been an important development in the field of materials science. Alanes and gallanes have been used in a variety of techniques, such as chemical vapor deposition and solution-based methodologies, to synthesize materials ranging from aluminum thin films to nanocrystalline 13-15 materials. This review is intended to capture the general features of the use of alanes and gallanes in the synthesis of solid state materials. (C) 2000 Elsevier Science S.A.

Original languageEnglish (US)
Pages (from-to)631-650
Number of pages20
JournalCoordination Chemistry Reviews
StatePublished - 2000

Bibliographical note

Funding Information:
The authors’ research in this area was supported by the National Science Foundation and the Center for Interfacial Engineering at the University of Minnesota. The authors would also like to thank Ms. H.-Y. Park for her assistance in the preparation of this manuscript.


  • Hydrides
  • Materials science
  • Solid state material


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