The postmodification of metal organic frameworks (MOFs) affords exceedingly high surface area materials with precisely installed chemical features, which provide new opportunities for detailed structure-function correlation in the field of catalysis. Here, we significantly expand upon the number of vapor-phase postmodification processes reported to date through screening a library of atomic layer deposition (ALD) precursors, which span metals across the periodic table and which include ligands from four distinct precursor classes. With a large library of precursors and synthesis conditions, we discern trends in the compatibility of precursor classes for well-behaved ALD in MOFs (AIM) and identify challenges and solutions to more precise postsynthetic modification.
|Original language||English (US)|
|Number of pages||9|
|Journal||Journal of the American Chemical Society|
|State||Published - Jan 8 2020|
Bibliographical noteFunding Information:
This work was supported as part of the Inorganometallic Catalysis Design Center, an Energy Frontier Research Center funded by the U.S. Department of Energy (DOE), Office of Science, Basic Energy Sciences under award no. DE-SC0012702. This research used resources of the Advanced Photon Source, a U.S. Department of Energy (DOE) Office of Science User Facility operated for the DOE Office of Science by Argonne National Laboratory under contract no. DE-AC02-06CH11357. I.S.K. acknowledges additional support from the Future Resource Program (2E29300), Korea Institute of Science and Technology (KIST).
© 2019 American Chemical Society.