Abstract
An analytical and numerical study was conducted to investigate the effect of pressure on gas phase nucleation. Thus, a sequence of chemical clustering reactions was assumed to model a generic self-clustering mechanism leading to particle formation. The results indicated that to minimize particle generation in chemical vapor deposition (CVD) reactors one should operate, all esle being equal, at lower absolute pressure in the reactor while maintaining a constant partial pressure of the reactants.
Original language | English (US) |
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Pages (from-to) | 736-745 |
Number of pages | 10 |
Journal | Journal of Chemical Physics |
Volume | 118 |
Issue number | 2 |
DOIs | |
State | Published - Jan 8 2003 |