The role of total pressure in gas-phase nucleation: A diffusion effect

S. M. Suh, S. L. Girshick, M. R. Zacharian

Research output: Contribution to journalArticlepeer-review

3 Scopus citations

Abstract

An analytical and numerical study was conducted to investigate the effect of pressure on gas phase nucleation. Thus, a sequence of chemical clustering reactions was assumed to model a generic self-clustering mechanism leading to particle formation. The results indicated that to minimize particle generation in chemical vapor deposition (CVD) reactors one should operate, all esle being equal, at lower absolute pressure in the reactor while maintaining a constant partial pressure of the reactants.

Original languageEnglish (US)
Pages (from-to)736-745
Number of pages10
JournalJournal of Chemical Physics
Volume118
Issue number2
DOIs
StatePublished - Jan 8 2003

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