This paper reviews processes to synthesize single-crystal silicon nanoparticles in an aerosol, then deposit the particles on the wafer to characterize the materials and build devices. By using plasma for particle formation, particle charge can be used to prevent particle agglomeration. This low-temperature process for constructing electronic devices never exposes the substrate to the very high temperature needed to form the single crystals.
Bibliographical noteFunding Information:
The authors acknowledge the support of the National Science Foundation through its awards DMI-0304211 and CTS-9876224.
Copyright 2018 Elsevier B.V., All rights reserved.