The deposition of low temperature sputtered In2O3 films using pulsed d.c magnetron sputtering from a powder target

Sreejith Karthikeyan, Arthur E. Hill, Richard D. Pilkington

Research output: Contribution to journalArticlepeer-review

16 Scopus citations

Abstract

Transparent conductive oxide layers are widely used in various applications such as solar cells, touch screen displays, heatable glasses, etc. This present work describes the deposition of transparent and conducting In 2O3 films from In2O3 powdered targets using a pulsed d.c magnetron sputtering technique without additional substrate heating or substrate biasing. The films deposited at various oxygen concentrations were approximately 500 nm thick, were pin-hole free and well adhered to the glass substrates. The material characteristics of the films were analysed using X-ray diffraction, four point probe, hot probe, UV-vis spectroscopy, atomic force microscopy and profilometry. Structural and electrical analyses revealed that the films were crystalline and highly conductive when sputtered in the absence of oxygen but a dramatic change in resistivity was observed when oxygen was introduced during the deposition. Resistivity increased from 0.004 Ω cm (no oxygen) to 5 Ω cm with 10% oxygen.

Original languageEnglish (US)
Pages (from-to)140-144
Number of pages5
JournalThin Solid Films
Volume550
DOIs
StatePublished - Jan 1 2014

Bibliographical note

Funding Information:
The authors gratefully acknowledge the Joule Centre for the funding of this project (Grant No: JSGP408/05 ). Sincere thanks are due to the Higher Education Funding Council for England (HEFCE) for the award of a research fellowship to Sreejith Karthikeyan under the ORSAS programme.

Keywords

  • Indium oxide thin films
  • Low temperature sputtering
  • Powder target sputtering
  • Pulsed d.c magnetron sputtering

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