Synthesis and thin-film orientation of poly(styrene-block- trimethylsilylisoprene)

Christopher M. Bates; Marco A Bedolla Pantoja; Jeffrey R. Strahan; Leon M. Dean; Brennen K. Mueller; Christopher J. Ellison; Paul F. Nealey; C. Grant Willson

doi:10.1002/pola.26375

Synthesis and thin-film orientation of poly(styrene-block- trimethylsilylisoprene)

Christopher M. Bates
, Marco A Bedolla Pantoja
, Jeffrey R. Strahan
, Leon M. Dean
, Brennen K. Mueller
, Christopher J. Ellison
, Paul F. Nealey
, C. Grant Willson

Chemical Engineering and Materials Science

Research output: Contribution to journal › Article › peer-review

15 Scopus citations

Abstract

The successful synthesis, characterization, and directed self-assembly of a silicon-containing block copolymer, poly(styrene-block-trimethylsilylisoprene) (P(S-b-TMSI)), which has much higher oxygen etch contrast than the de facto standard, poly(styrene-block-methyl methacrylate) is reported. A Sakurai, Grignard-type coupling reaction provided the key monomer in good yield. Living anionic polymerization was employed to prepare the block copolymer, which has very low polydispersity. P(S-b-TMSI) was successfully ordered and oriented by directed self-assembly.

Original language	English (US)
Pages (from-to)	290-297
Number of pages	8
Journal	Journal of Polymer Science, Part A: Polymer Chemistry
Volume	51
Issue number	2
DOIs	https://doi.org/10.1002/pola.26375
State	Published - Jan 15 2013

Keywords

anionic polymerization
diblock copolymers
directed self-assembly
lithography
trimethylsilylisoprene

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10.1002/pola.26375

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title = "Synthesis and thin-film orientation of poly(styrene-block- trimethylsilylisoprene)",

abstract = "The successful synthesis, characterization, and directed self-assembly of a silicon-containing block copolymer, poly(styrene-block-trimethylsilylisoprene) (P(S-b-TMSI)), which has much higher oxygen etch contrast than the de facto standard, poly(styrene-block-methyl methacrylate) is reported. A Sakurai, Grignard-type coupling reaction provided the key monomer in good yield. Living anionic polymerization was employed to prepare the block copolymer, which has very low polydispersity. P(S-b-TMSI) was successfully ordered and oriented by directed self-assembly.",

keywords = "anionic polymerization, diblock copolymers, directed self-assembly, lithography, trimethylsilylisoprene",

author = "Bates, \{Christopher M.\} and Pantoja, \{Marco A Bedolla\} and Strahan, \{Jeffrey R.\} and Dean, \{Leon M.\} and Mueller, \{Brennen K.\} and Ellison, \{Christopher J.\} and Nealey, \{Paul F.\} and Willson, \{C. Grant\}",

year = "2013",

month = jan,

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doi = "10.1002/pola.26375",

language = "English (US)",

volume = "51",

pages = "290--297",

journal = "Journal of Polymer Science, Part A: Polymer Chemistry",

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number = "2",

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TY - JOUR

T1 - Synthesis and thin-film orientation of poly(styrene-block- trimethylsilylisoprene)

AU - Bates, Christopher M.

AU - Pantoja, Marco A Bedolla

AU - Strahan, Jeffrey R.

AU - Dean, Leon M.

AU - Mueller, Brennen K.

AU - Ellison, Christopher J.

AU - Nealey, Paul F.

AU - Willson, C. Grant

PY - 2013/1/15

Y1 - 2013/1/15

N2 - The successful synthesis, characterization, and directed self-assembly of a silicon-containing block copolymer, poly(styrene-block-trimethylsilylisoprene) (P(S-b-TMSI)), which has much higher oxygen etch contrast than the de facto standard, poly(styrene-block-methyl methacrylate) is reported. A Sakurai, Grignard-type coupling reaction provided the key monomer in good yield. Living anionic polymerization was employed to prepare the block copolymer, which has very low polydispersity. P(S-b-TMSI) was successfully ordered and oriented by directed self-assembly.

AB - The successful synthesis, characterization, and directed self-assembly of a silicon-containing block copolymer, poly(styrene-block-trimethylsilylisoprene) (P(S-b-TMSI)), which has much higher oxygen etch contrast than the de facto standard, poly(styrene-block-methyl methacrylate) is reported. A Sakurai, Grignard-type coupling reaction provided the key monomer in good yield. Living anionic polymerization was employed to prepare the block copolymer, which has very low polydispersity. P(S-b-TMSI) was successfully ordered and oriented by directed self-assembly.

KW - anionic polymerization

KW - diblock copolymers

KW - directed self-assembly

KW - lithography

KW - trimethylsilylisoprene

UR - https://www.scopus.com/pages/publications/84870424237

UR - https://www.scopus.com/pages/publications/84870424237#tab=citedBy

U2 - 10.1002/pola.26375

DO - 10.1002/pola.26375

M3 - Article

AN - SCOPUS:84870424237

SN - 0887-624X

VL - 51

SP - 290

EP - 297

JO - Journal of Polymer Science, Part A: Polymer Chemistry

JF - Journal of Polymer Science, Part A: Polymer Chemistry

IS - 2

ER -

Synthesis and thin-film orientation of poly(styrene-block- trimethylsilylisoprene)

Abstract

Keywords

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