Synthesis and thin-film orientation of poly(styrene-block- trimethylsilylisoprene)

Christopher M. Bates, Marco A Bedolla Pantoja, Jeffrey R. Strahan, Leon M. Dean, Brennen K. Mueller, Christopher J. Ellison, Paul F. Nealey, C. Grant Willson

Research output: Contribution to journalArticlepeer-review

13 Scopus citations

Abstract

The successful synthesis, characterization, and directed self-assembly of a silicon-containing block copolymer, poly(styrene-block-trimethylsilylisoprene) (P(S-b-TMSI)), which has much higher oxygen etch contrast than the de facto standard, poly(styrene-block-methyl methacrylate) is reported. A Sakurai, Grignard-type coupling reaction provided the key monomer in good yield. Living anionic polymerization was employed to prepare the block copolymer, which has very low polydispersity. P(S-b-TMSI) was successfully ordered and oriented by directed self-assembly.

Original languageEnglish (US)
Pages (from-to)290-297
Number of pages8
JournalJournal of Polymer Science, Part A: Polymer Chemistry
Volume51
Issue number2
DOIs
StatePublished - Jan 15 2013

Keywords

  • anionic polymerization
  • diblock copolymers
  • directed self-assembly
  • lithography
  • trimethylsilylisoprene

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