Surface hydride composition of plasma deposited hydrogenated amorphous silicon: In situ infrared study of ion flux and temperature dependence

D. C. Marra, W. M.M. Kessels, M. C.M. Van de Sanden, K. Kashefizadeh, E. S. Aydil

Research output: Contribution to journal › Article › peer-review

45 Scopus citations

Fingerprint

Dive into the research topics of 'Surface hydride composition of plasma deposited hydrogenated amorphous silicon: In situ infrared study of ion flux and temperature dependence'. Together they form a unique fingerprint.

Engineering & Materials Science

Physics & Astronomy

Chemical Compounds