Keyphrases
Temperature Effect
100%
A-Si
100%
Hydrogenated Amorphous Silicon
100%
Ion Flux
100%
Infrared Study
100%
Surface Hydride
100%
Ion Temperature
100%
In Situ Infrared
100%
Substrate Temperature
66%
Hydrides
66%
Decomposition Reaction
66%
Silicon Surface
33%
Crystalline Silicon
33%
Silicon Hydride
33%
Attenuated Total reflectance-Fourier Transform Infrared Spectroscopy (ATR-FTIR)
33%
H-surfaces
33%
Hydrogenated
33%
Surface Sensitivity
33%
Surface Dangling Bonds
33%
Time Series Decomposition
33%
Hydrogen Coverage
33%
Engineering
Silicon Surface
100%
Hydrogenated Amorphous Silicon
100%
Temperature Dependence
100%
Phase Composition
100%
Deposited Film
50%
Substrate Temperature
50%
Crystalline Silicon
50%
Increasing Substrate Temperature
50%
Sensitive Surface
50%
Attenuated Total Reflection Infrared Spectroscopy
50%
Dangling Bond
50%
Physics
Temperature Dependence
100%
Ion Current
100%
Ion Temperature
100%
Blood Plasma
100%
Amorphous Silicon
100%
Silane
50%
Infrared Spectroscopy
50%
Material Science
Amorphous Silicon
100%
Hydride
100%
Surface (Surface Science)
100%
Phase Composition
100%
Silicon
40%
Film
40%
Chemical Decomposition
40%