Surface hydride composition of plasma deposited hydrogenated amorphous silicon: In situ infrared study of ion flux and temperature dependence

D. C. Marra, W. M.M. Kessels, M. C.M. Van de Sanden, K. Kashefizadeh, E. S. Aydil

Research output: Contribution to journal › Article › peer-review

44 Scopus citations

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