Surface diffusivity of thin polymer films measured by a curvature driven flow and Rouse dynamics

Ioannis Karapanagiotis; William W. Gerberich

doi:10.1016/j.susc.2006.01.022

Surface diffusivity of thin polymer films measured by a curvature driven flow and Rouse dynamics

Ioannis Karapanagiotis
, William W. Gerberich

Chemical Engineering and Materials Science

Research output: Contribution to journal › Article › peer-review

2 Scopus citations

Abstract

Nanodefects induced by nanoindentation on thin polystyrene (PS) films spin cast on silicon (Si) relax upon annealing at 110 °C. The relaxation process for low molecular weight PS is interpreted in terms of a curvature driven flow which leads to the measurement of a diffusion coefficient. The latter is compared with the expected Rouse predictions using (i) bulk Tgbulk and (ii) surface Tgsurf glass transition temperature data, found in the literature. Deviations from the Rouse predictions are observed when Tgbulk is used for the analysis of the data. On the contrary, excellent agreement with the Rouse model is reported when Tgsurf is used.

Original language	English (US)
Pages (from-to)	1178-1184
Number of pages	7
Journal	Surface Science
Volume	600
Issue number	5
DOIs	https://doi.org/10.1016/j.susc.2006.01.022
State	Published - Mar 1 2006

Bibliographical note

Funding Information:
Prior support by the Center for Interfacial Engineering (CIE), a National Science Foundation Engineering Research Center at the University of Minnesota is gratefully acknowledged.

Copyright:
Copyright 2008 Elsevier B.V., All rights reserved.

Keywords

Atomic force microscopy
Silicon
Surface defects
Surface energy
Surface relaxation and reconstruction
Surface roughening
Wetting

Publisher link

10.1016/j.susc.2006.01.022

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title = "Surface diffusivity of thin polymer films measured by a curvature driven flow and Rouse dynamics",

abstract = "Nanodefects induced by nanoindentation on thin polystyrene (PS) films spin cast on silicon (Si) relax upon annealing at 110 °C. The relaxation process for low molecular weight PS is interpreted in terms of a curvature driven flow which leads to the measurement of a diffusion coefficient. The latter is compared with the expected Rouse predictions using (i) bulk Tgbulk and (ii) surface Tgsurf glass transition temperature data, found in the literature. Deviations from the Rouse predictions are observed when Tgbulk is used for the analysis of the data. On the contrary, excellent agreement with the Rouse model is reported when Tgsurf is used.",

keywords = "Atomic force microscopy, Silicon, Surface defects, Surface energy, Surface relaxation and reconstruction, Surface roughening, Wetting",

author = "Ioannis Karapanagiotis and Gerberich, \{William W.\}",

note = "Funding Information: Prior support by the Center for Interfacial Engineering (CIE), a National Science Foundation Engineering Research Center at the University of Minnesota is gratefully acknowledged. Copyright: Copyright 2008 Elsevier B.V., All rights reserved.",

year = "2006",

month = mar,

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doi = "10.1016/j.susc.2006.01.022",

language = "English (US)",

volume = "600",

pages = "1178--1184",

journal = "Surface Science",

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T1 - Surface diffusivity of thin polymer films measured by a curvature driven flow and Rouse dynamics

AU - Karapanagiotis, Ioannis

AU - Gerberich, William W.

N1 - Funding Information: Prior support by the Center for Interfacial Engineering (CIE), a National Science Foundation Engineering Research Center at the University of Minnesota is gratefully acknowledged. Copyright: Copyright 2008 Elsevier B.V., All rights reserved.

PY - 2006/3/1

Y1 - 2006/3/1

N2 - Nanodefects induced by nanoindentation on thin polystyrene (PS) films spin cast on silicon (Si) relax upon annealing at 110 °C. The relaxation process for low molecular weight PS is interpreted in terms of a curvature driven flow which leads to the measurement of a diffusion coefficient. The latter is compared with the expected Rouse predictions using (i) bulk Tgbulk and (ii) surface Tgsurf glass transition temperature data, found in the literature. Deviations from the Rouse predictions are observed when Tgbulk is used for the analysis of the data. On the contrary, excellent agreement with the Rouse model is reported when Tgsurf is used.

AB - Nanodefects induced by nanoindentation on thin polystyrene (PS) films spin cast on silicon (Si) relax upon annealing at 110 °C. The relaxation process for low molecular weight PS is interpreted in terms of a curvature driven flow which leads to the measurement of a diffusion coefficient. The latter is compared with the expected Rouse predictions using (i) bulk Tgbulk and (ii) surface Tgsurf glass transition temperature data, found in the literature. Deviations from the Rouse predictions are observed when Tgbulk is used for the analysis of the data. On the contrary, excellent agreement with the Rouse model is reported when Tgsurf is used.

KW - Atomic force microscopy

KW - Silicon

KW - Surface defects

KW - Surface energy

KW - Surface relaxation and reconstruction

KW - Surface roughening

KW - Wetting

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UR - https://www.scopus.com/pages/publications/33644599887#tab=citedBy

U2 - 10.1016/j.susc.2006.01.022

DO - 10.1016/j.susc.2006.01.022

M3 - Article

AN - SCOPUS:33644599887

SN - 0039-6028

VL - 600

SP - 1178

EP - 1184

JO - Surface Science

JF - Surface Science

IS - 5

ER -

Surface diffusivity of thin polymer films measured by a curvature driven flow and Rouse dynamics

Abstract

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