Superior tolerance of Ag/Ni multilayers against Kr ion irradiation: An in situ study

K. Y. Yu, C. Sun, Y. Chen, Y. Liu, H. Wang, M. A. Kirk, M. Li, X. Zhang

Research output: Contribution to journalArticlepeer-review

33 Scopus citations

Abstract

Monolithic Ag and Ni films and Ag/Ni multilayers with individual layer thickness of 5 and 50 nm were subjected to in situ Kr ion irradiation at room temperature to 1 displacement-per-atom (a fluence of 2 × 1014 ions/cm2). Monolithic Ag has high density of small loops (4 nm in diameter), whereas Ni has fewer but much greater loops (exceeding 20 nm). In comparison, dislocation loops, ∼4 nm in diameter, were the major defects in the irradiated Ag/Ni 50 nm film, while the loops were barely observed in the Ag/Ni 5 nm film. At 0.2 dpa (0.4 × 1014 ions/cm), defect density in both monolithic Ag and Ni saturated at 1.6 and 0.2 × 10 23/m3, compared with 0.8 × 1023/m 3 in Ag/Ni 50 nm multilayer at a saturation fluence of ∼1 dpa (2 × 1014 ions/cm2). Direct observations of frequent loop absorption by layer interfaces suggest that these interfaces are efficient defect sinks. Ag/Ni 5 nm multilayer showed a superior morphological stability against radiation compared to Ag/Ni 50 nm film.

Original languageEnglish (US)
Pages (from-to)3547-3562
Number of pages16
JournalPhilosophical Magazine
Volume93
Issue number26
DOIs
StatePublished - Sep 1 2013

Keywords

  • Ag/Ni
  • Kr
  • in situ radiation
  • interface

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