Submicro-pillars and holes from the depth-wise Talbot images of a conical phase mask

In Ho Lee, Seung Chul Park, Sin Doo Lee

Research output: Contribution to journalArticle

2 Citations (Scopus)

Abstract

We construct two-dimensional arrays of submicro-pillars and holes from the depth-wise Talbot images of a conical phase mask in a photoactive layer prepared on a quartz substrate. In contrast to the conventional Talbot lithography employing only one image in the photoactive layer, two images of the phase mask are produced in a depthwise manner such that the pillar patterns are in the primary image plane while the hole patterns in the secondary image plane according to the penetration depth of the exposure energy. The conical symmetry plays a critical role in producing the covariant patterns of the phase mask in the photoactive layer through the suppression of higher orders of diffraction. Our two image-type approach is simple and versatile for producing different kinds of periodic structures for photonic applications and surface engineering on a micrometer-to-nanometer scale.

Original languageEnglish (US)
Pages (from-to)25866-25873
Number of pages8
JournalOptics Express
Volume23
Issue number20
DOIs
StatePublished - Oct 5 2015

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masks
micrometers
lithography
penetration
quartz
retarding
engineering
photonics
symmetry
diffraction
energy

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Submicro-pillars and holes from the depth-wise Talbot images of a conical phase mask. / Lee, In Ho; Park, Seung Chul; Lee, Sin Doo.

In: Optics Express, Vol. 23, No. 20, 05.10.2015, p. 25866-25873.

Research output: Contribution to journalArticle

Lee, In Ho ; Park, Seung Chul ; Lee, Sin Doo. / Submicro-pillars and holes from the depth-wise Talbot images of a conical phase mask. In: Optics Express. 2015 ; Vol. 23, No. 20. pp. 25866-25873.
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