Sub-5 nm domains in ordered poly(cyclohexylethylene)- block -poly(methyl methacrylate) block polymers for lithography

Justin G. Kennemur, Li Yao, Frank S. Bates, Marc A. Hillmyer

Research output: Contribution to journal › Article › peer-review

202 Scopus citations

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Keyphrases

Chemistry

Material Science

Pharmacology, Toxicology and Pharmaceutical Science