Studies of the volume and plasma sheath properties of radio frequency discharges

Douglas Ernie, H. J. Oskam

Research output: Chapter in Book/Report/Conference proceedingChapter

Abstract

Radio frequency discharges currently play a major role in the microelectronics industry for the fabrication of integrated circuits. This report describes theoretical and experimental studies undertaken in an effort to develop a better understanding of some of the underlying gas discharge physics occurring in these discharges. An equivalent circuit model for a planar rf plasma reactor is presented. A model is outlined for the energy distribution of ions bombarding electrode surfaces in planar rf plasma reactors at low pressures. In an effort to obtain a reliable experimental data base for comparison with the results from the ion bombardment energy distribution model, an experimental system was designed and constructed to measure the ion bombardment energy distribution at an electrode in a planar rf reactor. In an effort to investigate the effects of negative ions on the plasma sheath characteristics, a sheath model was developed for a plasma. A model is presented for the radial distribution of ion and electron densities and electric field strength in the positive column of a dc discharge for a plasma.

Original languageEnglish (US)
Title of host publicationTechnical Report AFWAL-TR - Air Force Wright Aeronautical Laboratories (United States)
Volume88
Edition2103
StatePublished - Nov 1 1988

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