Stress mapping sensors for high power adaptive microoptics

Mohd Suffian B. Zamali, Joseph J. Talghader

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

Directional stress and temperature effects are simultaneously measured and decoupled in micromachined membrane mirrors using a group of three ion implanted silicon resistors with different orientations. In a demonstration mirror, the sensors show compressive thermal stress changes of about -0.5±0.08 MPa/°C and -0.66±0.09 MPa/°C in the x and y-direction respectively.

Original languageEnglish (US)
Title of host publicationIEEE/LEOS Optical MEMS 2005
Subtitle of host publicationInternational Conference on Optical MEMS and Their Applications
Pages187-188
Number of pages2
DOIs
StatePublished - Dec 1 2005
EventIEEE/LEOS Optical MEMS 2005: International Conference on Optical MEMS and Their Applications - Oulu, Finland
Duration: Aug 1 2005Aug 4 2005

Publication series

NameIEEE/LEOS Optical MEMS 2005: International Conference on Optical MEMS and Their Applications

Other

OtherIEEE/LEOS Optical MEMS 2005: International Conference on Optical MEMS and Their Applications
CountryFinland
CityOulu
Period8/1/058/4/05

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  • Cite this

    Zamali, M. S. B., & Talghader, J. J. (2005). Stress mapping sensors for high power adaptive microoptics. In IEEE/LEOS Optical MEMS 2005: International Conference on Optical MEMS and Their Applications (pp. 187-188). [1540142] (IEEE/LEOS Optical MEMS 2005: International Conference on Optical MEMS and Their Applications). https://doi.org/10.1109/OMEMS.2005.1540142