SPUTTERING YIELDS OF ELECTROCHEMICALLY DEPOSITED METAL AND METAL OXIDE THIN FILMS.

D. M. Ullevig, J. F. Evans

Research output: Contribution to journalConference articlepeer-review

5 Scopus citations

Abstract

A quartz crystal microbalance is used to examine the sputtering yields (1 Kev Ar) of electrodeposited nickel, iron and the thermally grown oxides of these materials. The yields (g multiplied by (times) ion** minus **1) determined for the metals agree well with those found in the literature. Initial sputtering yields for the oxides are shown to decrease in an exponential manner to a constant value which is significantly lower than that of the metal. Damage cross sections are calculated from these data for argon ions incident upon these materials. XPS is used to examine the chemical consequences of ion bombardment of the oxides. In both cases some of the oxide is reduced to the metal and the metal to oxygen ratio correspondingly increases.

Original languageEnglish (US)
Pages (from-to)379-382
Number of pages4
JournalJournal of vacuum science & technology
Volume20
Issue number3
DOIs
StatePublished - Jan 1 1981
EventProc of the Natl Symp of the Am Vac Soc, Pt 1 - Anaheim, Calif, USA
Duration: Nov 2 1981Nov 6 1981

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