Spontaneous alignment of self-assembled ABC triblock terpolymers for large-area nanolithography

T. Kubo; R. F. Wang; D. A. Olson; M. Rodwogin; M. A. Hillmyer; C. Leighton

doi:10.1063/1.2975370

Spontaneous alignment of self-assembled ABC triblock terpolymers for large-area nanolithography

T. Kubo
, R. F. Wang
, D. A. Olson
, M. Rodwogin
, M. A. Hillmyer
, C. Leighton

Research output: Contribution to journal › Article › peer-review

16 Scopus citations

Abstract

A general method for preparation of large-area inorganic nanostructure arrays based on the use of core-shell cylinder forming ABC triblock terpolymers is presented. The essential perpendicular cylinder alignment is achieved by the use of a low surface energy B block (polyisoprene), which drives spontaneous perpendicular alignment of cylindrical C domains (polylactide) in a matrix of A (polystyrene), eliminating the lengthy anneal steps, external field alignment procedures, or specialized surface preparations that could severely restrict potential applications.

Original language	English (US)
Article number	133112
Journal	Applied Physics Letters
Volume	93
Issue number	13
DOIs	https://doi.org/10.1063/1.2975370
State	Published - 2008

Bibliographical note

Funding Information:
Work supported by INSIC, Fuji Electric/UMN MINT, NSF (Grant No. DMR 0605880), and the NSF MRSEC (Grant No. DMR-0212302).

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10.1063/1.2975370

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title = "Spontaneous alignment of self-assembled ABC triblock terpolymers for large-area nanolithography",

abstract = "A general method for preparation of large-area inorganic nanostructure arrays based on the use of core-shell cylinder forming ABC triblock terpolymers is presented. The essential perpendicular cylinder alignment is achieved by the use of a low surface energy B block (polyisoprene), which drives spontaneous perpendicular alignment of cylindrical C domains (polylactide) in a matrix of A (polystyrene), eliminating the lengthy anneal steps, external field alignment procedures, or specialized surface preparations that could severely restrict potential applications.",

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note = "Funding Information: Work supported by INSIC, Fuji Electric/UMN MINT, NSF (Grant No. DMR 0605880), and the NSF MRSEC (Grant No. DMR-0212302).",

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doi = "10.1063/1.2975370",

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T1 - Spontaneous alignment of self-assembled ABC triblock terpolymers for large-area nanolithography

AU - Kubo, T.

AU - Wang, R. F.

AU - Olson, D. A.

AU - Rodwogin, M.

AU - Hillmyer, M. A.

AU - Leighton, C.

N1 - Funding Information: Work supported by INSIC, Fuji Electric/UMN MINT, NSF (Grant No. DMR 0605880), and the NSF MRSEC (Grant No. DMR-0212302).

PY - 2008

Y1 - 2008

N2 - A general method for preparation of large-area inorganic nanostructure arrays based on the use of core-shell cylinder forming ABC triblock terpolymers is presented. The essential perpendicular cylinder alignment is achieved by the use of a low surface energy B block (polyisoprene), which drives spontaneous perpendicular alignment of cylindrical C domains (polylactide) in a matrix of A (polystyrene), eliminating the lengthy anneal steps, external field alignment procedures, or specialized surface preparations that could severely restrict potential applications.

AB - A general method for preparation of large-area inorganic nanostructure arrays based on the use of core-shell cylinder forming ABC triblock terpolymers is presented. The essential perpendicular cylinder alignment is achieved by the use of a low surface energy B block (polyisoprene), which drives spontaneous perpendicular alignment of cylindrical C domains (polylactide) in a matrix of A (polystyrene), eliminating the lengthy anneal steps, external field alignment procedures, or specialized surface preparations that could severely restrict potential applications.

UR - https://www.scopus.com/pages/publications/53349173843

UR - https://www.scopus.com/pages/publications/53349173843#tab=citedBy

U2 - 10.1063/1.2975370

DO - 10.1063/1.2975370

M3 - Article

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SN - 0003-6951

VL - 93

JO - Applied Physics Letters

JF - Applied Physics Letters

IS - 13

M1 - 133112

ER -

Spontaneous alignment of self-assembled ABC triblock terpolymers for large-area nanolithography

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