Abstract
A customizable and predictive BSIM model was generated for devices with Leff down to 12 nm and a wide range of interconnect sizes. The main advantages of this approach over previous work were its applicability to generic technologies as well as the ease of use provided by a Web-based distribution model. These predictive technology models will be useful for circuit design research aimed at processes that were not yet available.
| Original language | English (US) |
|---|---|
| Pages (from-to) | 17-23 |
| Number of pages | 7 |
| Journal | IEEE Circuits and Devices Magazine |
| Volume | 19 |
| Issue number | 4 |
| DOIs | |
| State | Published - Jul 2003 |
| Externally published | Yes |
Bibliographical note
Funding Information:The authors thank Dr. J. Park- hurst, Dr. K. Soumyanath, and Dr. V.K. De for valuable sugges tions to this project. This re search is sponsored by the Semiconductor Research Com mittee (SRC) under SRC 99-NJ-697.