Spatial Control of the Self-assembled Block Copolymer Domain Orientation and Alignment on Photopatterned Surfaces

Ji Yeon Kim; Philip Liu; Michael J. Maher; Devon H. Callan; Christopher M. Bates; Matthew C. Carlson; Yusuke Asano; Gregory Blachut; Charles T. Rettner; Joy Y. Cheng; Daniel F. Sunday; R. Joseph Kline; Daniel P. Sanders; Nathaniel A. Lynd; Christopher J. Ellison; C. Grant Willson; Carlos R. Baiz

doi:10.1021/acsami.0c02997

Spatial Control of the Self-assembled Block Copolymer Domain Orientation and Alignment on Photopatterned Surfaces

Ji Yeon Kim, Philip Liu, Michael J. Maher, Devon H. Callan, Christopher M. Bates, Matthew C. Carlson, Yusuke Asano, Gregory Blachut, Charles T. Rettner, Joy Y. Cheng, Daniel F. Sunday, R. Joseph Kline, Daniel P. Sanders, Nathaniel A. Lynd, Christopher J. Ellison, C. Grant Willson, Carlos R. Baiz

Chemical Engineering and Materials Science

Research output: Contribution to journal › Article › peer-review

10 Scopus citations

Abstract

Polarity-switching photopatternable guidelines can be directly used to both orient and direct the self-assembly of block copolymers. We report the orientation and alignment of poly(styrene-block-4-trimethylsilylstyrene) (PS-b-PTMSS) with a domain periodicity, L₀, of 44 nm on thin photopatternable grafting surface treatments (pGSTs) and cross-linkable surface treatments (pXSTs), containing acid-labile 4-tert-butoxystyrene monomer units. The surface treatment was exposed using electron beam lithography to create well-defined linear arrays of neutral and preferential regions. Directed self-assembly (DSA) of PS-b-PTMSS with much lower defectivity was observed on pXST than on pGST guidelines. The study of the effect of film thickness on photoacid diffusion by Fourier transform infrared spectroscopy and near-edge X-ray absorption fine structure spectroscopy suggested slower diffusion in thinner films, potentially enabling production of guidelines with sharper interfaces between the unexposed and exposed lines, and thus, the DSA of PS-b-PTMSS on thinner pXST guidelines resulted in better alignment control.

Original language	English (US)
Pages (from-to)	23399-23409
Number of pages	11
Journal	ACS Applied Materials and Interfaces
Volume	12
Issue number	20
DOIs	https://doi.org/10.1021/acsami.0c02997
State	Published - May 20 2020

Bibliographical note

Publisher Copyright:
© 2020 American Chemical Society.

Keywords

NEXAFS spectroscopy
block copolymers
directed self-assembly
infrared spectroscopy
lithography
photoacid diffusion
photopatterning
thin films

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10.1021/acsami.0c02997

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Kim, J. Y., Liu, P., Maher, M. J., Callan, D. H., Bates, C. M., Carlson, M. C., Asano, Y., Blachut, G., Rettner, C. T., Cheng, J. Y., Sunday, D. F., Kline, R. J., Sanders, D. P., Lynd, N. A., Ellison, C. J., Willson, C. G., & Baiz, C. R. (2020). Spatial Control of the Self-assembled Block Copolymer Domain Orientation and Alignment on Photopatterned Surfaces. ACS Applied Materials and Interfaces, 12(20), 23399-23409. https://doi.org/10.1021/acsami.0c02997

Kim, JY, Liu, P, Maher, MJ, Callan, DH, Bates, CM, Carlson, MC, Asano, Y, Blachut, G, Rettner, CT, Cheng, JY, Sunday, DF, Kline, RJ, Sanders, DP, Lynd, NA, Ellison, CJ, Willson, CG & Baiz, CR 2020, 'Spatial Control of the Self-assembled Block Copolymer Domain Orientation and Alignment on Photopatterned Surfaces', ACS Applied Materials and Interfaces, vol. 12, no. 20, pp. 23399-23409. https://doi.org/10.1021/acsami.0c02997

@article{a9d998cf01ad4919b3283bb803b6a39f,

title = "Spatial Control of the Self-assembled Block Copolymer Domain Orientation and Alignment on Photopatterned Surfaces",

abstract = "Polarity-switching photopatternable guidelines can be directly used to both orient and direct the self-assembly of block copolymers. We report the orientation and alignment of poly(styrene-block-4-trimethylsilylstyrene) (PS-b-PTMSS) with a domain periodicity, L0, of 44 nm on thin photopatternable grafting surface treatments (pGSTs) and cross-linkable surface treatments (pXSTs), containing acid-labile 4-tert-butoxystyrene monomer units. The surface treatment was exposed using electron beam lithography to create well-defined linear arrays of neutral and preferential regions. Directed self-assembly (DSA) of PS-b-PTMSS with much lower defectivity was observed on pXST than on pGST guidelines. The study of the effect of film thickness on photoacid diffusion by Fourier transform infrared spectroscopy and near-edge X-ray absorption fine structure spectroscopy suggested slower diffusion in thinner films, potentially enabling production of guidelines with sharper interfaces between the unexposed and exposed lines, and thus, the DSA of PS-b-PTMSS on thinner pXST guidelines resulted in better alignment control.",

keywords = "NEXAFS spectroscopy, block copolymers, directed self-assembly, infrared spectroscopy, lithography, photoacid diffusion, photopatterning, thin films",

author = "Kim, {Ji Yeon} and Philip Liu and Maher, {Michael J.} and Callan, {Devon H.} and Bates, {Christopher M.} and Carlson, {Matthew C.} and Yusuke Asano and Gregory Blachut and Rettner, {Charles T.} and Cheng, {Joy Y.} and Sunday, {Daniel F.} and Kline, {R. Joseph} and Sanders, {Daniel P.} and Lynd, {Nathaniel A.} and Ellison, {Christopher J.} and Willson, {C. Grant} and Baiz, {Carlos R.}",

note = "Publisher Copyright: {\textcopyright} 2020 American Chemical Society.",

year = "2020",

month = may,

day = "20",

doi = "10.1021/acsami.0c02997",

language = "English (US)",

volume = "12",

pages = "23399--23409",

journal = "ACS Applied Materials and Interfaces",

issn = "1944-8244",

publisher = "American Chemical Society",

number = "20",

}

TY - JOUR

T1 - Spatial Control of the Self-assembled Block Copolymer Domain Orientation and Alignment on Photopatterned Surfaces

AU - Kim, Ji Yeon

AU - Liu, Philip

AU - Maher, Michael J.

AU - Callan, Devon H.

AU - Bates, Christopher M.

AU - Carlson, Matthew C.

AU - Asano, Yusuke

AU - Blachut, Gregory

AU - Rettner, Charles T.

AU - Cheng, Joy Y.

AU - Sunday, Daniel F.

AU - Kline, R. Joseph

AU - Sanders, Daniel P.

AU - Lynd, Nathaniel A.

AU - Ellison, Christopher J.

AU - Willson, C. Grant

AU - Baiz, Carlos R.

PY - 2020/5/20

Y1 - 2020/5/20

N2 - Polarity-switching photopatternable guidelines can be directly used to both orient and direct the self-assembly of block copolymers. We report the orientation and alignment of poly(styrene-block-4-trimethylsilylstyrene) (PS-b-PTMSS) with a domain periodicity, L0, of 44 nm on thin photopatternable grafting surface treatments (pGSTs) and cross-linkable surface treatments (pXSTs), containing acid-labile 4-tert-butoxystyrene monomer units. The surface treatment was exposed using electron beam lithography to create well-defined linear arrays of neutral and preferential regions. Directed self-assembly (DSA) of PS-b-PTMSS with much lower defectivity was observed on pXST than on pGST guidelines. The study of the effect of film thickness on photoacid diffusion by Fourier transform infrared spectroscopy and near-edge X-ray absorption fine structure spectroscopy suggested slower diffusion in thinner films, potentially enabling production of guidelines with sharper interfaces between the unexposed and exposed lines, and thus, the DSA of PS-b-PTMSS on thinner pXST guidelines resulted in better alignment control.

AB - Polarity-switching photopatternable guidelines can be directly used to both orient and direct the self-assembly of block copolymers. We report the orientation and alignment of poly(styrene-block-4-trimethylsilylstyrene) (PS-b-PTMSS) with a domain periodicity, L0, of 44 nm on thin photopatternable grafting surface treatments (pGSTs) and cross-linkable surface treatments (pXSTs), containing acid-labile 4-tert-butoxystyrene monomer units. The surface treatment was exposed using electron beam lithography to create well-defined linear arrays of neutral and preferential regions. Directed self-assembly (DSA) of PS-b-PTMSS with much lower defectivity was observed on pXST than on pGST guidelines. The study of the effect of film thickness on photoacid diffusion by Fourier transform infrared spectroscopy and near-edge X-ray absorption fine structure spectroscopy suggested slower diffusion in thinner films, potentially enabling production of guidelines with sharper interfaces between the unexposed and exposed lines, and thus, the DSA of PS-b-PTMSS on thinner pXST guidelines resulted in better alignment control.

KW - NEXAFS spectroscopy

KW - block copolymers

KW - directed self-assembly

KW - infrared spectroscopy

KW - lithography

KW - photoacid diffusion

KW - photopatterning

KW - thin films

UR - http://www.scopus.com/inward/record.url?scp=85085534883&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=85085534883&partnerID=8YFLogxK

U2 - 10.1021/acsami.0c02997

DO - 10.1021/acsami.0c02997

M3 - Article

C2 - 32345022

AN - SCOPUS:85085534883

SN - 1944-8244

VL - 12

SP - 23399

EP - 23409

JO - ACS Applied Materials and Interfaces

JF - ACS Applied Materials and Interfaces

IS - 20

ER -

Spatial Control of the Self-assembled Block Copolymer Domain Orientation and Alignment on Photopatterned Surfaces

Abstract

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