Spatial and temporal variation of the ion flux impinging on the wafer surface in presence of a plasma instability

Tae Won Kim, Eray S. Aydil

Research output: Contribution to journalArticlepeer-review

4 Scopus citations

Abstract

An array of planar Langmuir probes on a 75 mm diameter wafer was designed, built and used to measure the variation of ion flux and its spatiotemporal distribution at the plane of wafer in an inductively coupled plasma reactor. The use of this probe array was demonstrated to detect, monitor and display the spatiotemporal variation of the ion flux in presence of a plasma instability. The ion flux distributions were collected in an inductively coupled plasma reactor. Argon plasma was also created using a spiral coil wrapped around a 150-mm diameter quartz tube and powered by a 13.56 MHz radio frequency generator.

Original languageEnglish (US)
Pages (from-to)120-121
Number of pages2
JournalIEEE Transactions on Plasma Science
Volume30
Issue number1 I
DOIs
StatePublished - Feb 2002

Bibliographical note

Funding Information:
Manuscript received July 3, 2001; revised October 9, 2001. This work was supported in part by the State of California SMART program under research contract SM99-01, and by the following participating companies: Advanced Energy, ASML, Atmel Corp., Advanced Micro Devices, Applied Materials, Asyst Technologies Inc., Cymer, Etec Systems Inc., Intel Corporation, KLA-TENCOR, Lam Research Corp., Nikon Research Corp., Novellus Systems Inc., Silicon Valley Group, and Tokyo Electron Limited.

Keywords

  • Plasma materials-processing applications
  • Plasma measurements
  • Plasma oscillations
  • Plasma stability

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