An array of planar Langmuir probes on a 75 mm diameter wafer was designed, built and used to measure the variation of ion flux and its spatiotemporal distribution at the plane of wafer in an inductively coupled plasma reactor. The use of this probe array was demonstrated to detect, monitor and display the spatiotemporal variation of the ion flux in presence of a plasma instability. The ion flux distributions were collected in an inductively coupled plasma reactor. Argon plasma was also created using a spiral coil wrapped around a 150-mm diameter quartz tube and powered by a 13.56 MHz radio frequency generator.
Bibliographical noteFunding Information:
Manuscript received July 3, 2001; revised October 9, 2001. This work was supported in part by the State of California SMART program under research contract SM99-01, and by the following participating companies: Advanced Energy, ASML, Atmel Corp., Advanced Micro Devices, Applied Materials, Asyst Technologies Inc., Cymer, Etec Systems Inc., Intel Corporation, KLA-TENCOR, Lam Research Corp., Nikon Research Corp., Novellus Systems Inc., Silicon Valley Group, and Tokyo Electron Limited.
- Plasma materials-processing applications
- Plasma measurements
- Plasma oscillations
- Plasma stability