SiO2 nanorod thin film encapsulated by Al2O 3 with atomic layer deposition and its optical application

Sangho S. Kim, Nicholas T. Gabriel, Woo Bin Song, Joseph J. Talghader

Research output: Chapter in Book/Report/Conference proceedingConference contribution

1 Scopus citations

Abstract

Low refractive index materials such as SiO2 nanorods or nanoporous SiO2 (np-SiO2) and MgF2 have been attractive for use in various types of optical coatings. Due to the high porosity of the films, however, the material properties of these films are unstable. This phenomenon is confirmed in dry versus humid ambient where both the coefficient of thermal expansion (CTE) and refractive index change dramatically. We report here that the properties of np-SiO2 can be stabilized by depositing a cap layer of Al2O3 using Atomic Layer Deposition (ALD) on top. This stabilizing ability is demonstrated successfully for single layer and distributed Bragg reflectors (DBR). With this method, one can pattern nanoporous sensors so that some regions are stable for packaging while others are exposed to show enhanced interactions with environment for sensing.

Original languageEnglish (US)
Title of host publication2008 8th IEEE Conference on Nanotechnology, IEEE-NANO
Pages793-796
Number of pages4
DOIs
StatePublished - Nov 10 2008
Event2008 8th IEEE Conference on Nanotechnology, IEEE-NANO - Arlington, TX, United States
Duration: Aug 18 2008Aug 21 2008

Publication series

Name2008 8th IEEE Conference on Nanotechnology, IEEE-NANO

Other

Other2008 8th IEEE Conference on Nanotechnology, IEEE-NANO
CountryUnited States
CityArlington, TX
Period8/18/088/21/08

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    Kim, S. S., Gabriel, N. T., Song, W. B., & Talghader, J. J. (2008). SiO2 nanorod thin film encapsulated by Al2O 3 with atomic layer deposition and its optical application. In 2008 8th IEEE Conference on Nanotechnology, IEEE-NANO (pp. 793-796). [4617219] (2008 8th IEEE Conference on Nanotechnology, IEEE-NANO). https://doi.org/10.1109/NANO.2008.237