SiO2 nanorod thin film encapsulated by Al2O 3 with atomic layer deposition and its optical application

Sangho S. Kim; Nicholas T. Gabriel; Woo Bin Song; Joseph J. Talghader

doi:10.1109/NANO.2008.237

SiO₂ nanorod thin film encapsulated by Al₂O ₃ with atomic layer deposition and its optical application

Sangho S. Kim, Nicholas T. Gabriel, Woo Bin Song, Joseph J. Talghader

Electrical and Computer Engineering

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

3 Scopus citations

Abstract

Low refractive index materials such as SiO₂ nanorods or nanoporous SiO₂ (np-SiO₂) and MgF₂ have been attractive for use in various types of optical coatings. Due to the high porosity of the films, however, the material properties of these films are unstable. This phenomenon is confirmed in dry versus humid ambient where both the coefficient of thermal expansion (CTE) and refractive index change dramatically. We report here that the properties of np-SiO₂ can be stabilized by depositing a cap layer of Al₂O₃ using Atomic Layer Deposition (ALD) on top. This stabilizing ability is demonstrated successfully for single layer and distributed Bragg reflectors (DBR). With this method, one can pattern nanoporous sensors so that some regions are stable for packaging while others are exposed to show enhanced interactions with environment for sensing.

Original language	English (US)
Title of host publication	2008 8th IEEE Conference on Nanotechnology, IEEE-NANO
Pages	793-796
Number of pages	4
DOIs	https://doi.org/10.1109/NANO.2008.237
State	Published - 2008
Event	2008 8th IEEE Conference on Nanotechnology, IEEE-NANO - Arlington, TX, United States Duration: Aug 18 2008 → Aug 21 2008

Publication series

Name	2008 8th IEEE Conference on Nanotechnology, IEEE-NANO

Other

Other	2008 8th IEEE Conference on Nanotechnology, IEEE-NANO
Country/Territory	United States
City	Arlington, TX
Period	8/18/08 → 8/21/08

Publisher link

10.1109/NANO.2008.237

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Cite this

SiO₂ nanorod thin film encapsulated by Al₂O ₃ with atomic layer deposition and its optical application. / Kim, Sangho S.; Gabriel, Nicholas T.; Song, Woo Bin et al.
2008 8th IEEE Conference on Nanotechnology, IEEE-NANO. 2008. p. 793-796 4617219 (2008 8th IEEE Conference on Nanotechnology, IEEE-NANO).

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

Kim, SS, Gabriel, NT, Song, WB & Talghader, JJ 2008, SiO₂ nanorod thin film encapsulated by Al₂O ₃ with atomic layer deposition and its optical application. in 2008 8th IEEE Conference on Nanotechnology, IEEE-NANO., 4617219, 2008 8th IEEE Conference on Nanotechnology, IEEE-NANO, pp. 793-796, 2008 8th IEEE Conference on Nanotechnology, IEEE-NANO, Arlington, TX, United States, 8/18/08. https://doi.org/10.1109/NANO.2008.237

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abstract = "Low refractive index materials such as SiO2 nanorods or nanoporous SiO2 (np-SiO2) and MgF2 have been attractive for use in various types of optical coatings. Due to the high porosity of the films, however, the material properties of these films are unstable. This phenomenon is confirmed in dry versus humid ambient where both the coefficient of thermal expansion (CTE) and refractive index change dramatically. We report here that the properties of np-SiO2 can be stabilized by depositing a cap layer of Al2O3 using Atomic Layer Deposition (ALD) on top. This stabilizing ability is demonstrated successfully for single layer and distributed Bragg reflectors (DBR). With this method, one can pattern nanoporous sensors so that some regions are stable for packaging while others are exposed to show enhanced interactions with environment for sensing.",

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