@inproceedings{e64df53cd07c498cb8694a9748d19dbc,
title = "Simulation of particle growth and transport in a dusty plasma",
abstract = "The formation of dust particles during plasma-enhanced chemical vapor deposition can be beneficial to the properties of silicon thin films if deposition size and concentration can be controlled. Particle growth, transport, and charging models are combined with a plasma model to predict the size, charge, and spatial distributions of particles under typical deposition conditions. Plasma-particle interactions are discussed, and charge distribution results are presented. Positively charged particles are found to exist in regions near the electrodes, and may have a significant impact on both particle growth and film composition.",
keywords = "Coagulation, Nanoparticle charging, Plasma-enhanced chemical vapor deposition",
author = "Warthesen, {S. J.} and Girshick, {S. L.}",
year = "2005",
month = oct,
day = "31",
doi = "10.1063/1.2134601",
language = "English (US)",
isbn = "0735402876",
series = "AIP Conference Proceedings",
pages = "205--208",
booktitle = "NEW VISTAS IN DUSTY PLASMAS",
note = "4th International Conference on the Physics of Dusty Plasmas ; Conference date: 13-06-2005 Through 17-06-2005",
}