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Scaling behavior of columnar structure during physical vapor deposition
W. J. Meese
, T. M. Lu
Research output
:
Contribution to journal
›
Article
›
peer-review
3
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Scopus citations
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Keyphrases
Columnar Structure
100%
Scaling Behavior
100%
Column Diameter
100%
Physical Vapor Deposition
100%
Quantitative Characterization
66%
Chamber Pressure
66%
High Pressure
33%
Monte Carlo Method
33%
Growth Front
33%
Correlation Length
33%
Cosine
33%
Power Law
33%
Film Surface
33%
Low Pressure
33%
Thin Film Morphology
33%
Vapor Pressure
33%
Film Morphology
33%
Flux Distribution
33%
Power Distribution
33%
Statistical Interaction
33%
Sputter Deposition
33%
Incident Flux
33%
Monte Carlo Sampling
33%
Solid Growth
33%
Column Separation
33%
Flux Model
33%
Thorntons
33%
Fast Monte Carlo
33%
Deposition Angle
33%
Solid-on-Solid
33%
Structure Zone Model
33%
Theoretical Understanding
33%
Hard-sphere Collisions
33%
Wavelength Exponent
33%
Engineering
Physical Vapor Deposition
100%
Columnar Structure
100%
Column Diameter
100%
Chamber Pressure
66%
Correlation Length
33%
Film Surface
33%
Power Distribution
33%
Empirical Model
33%
Saturates
33%
Gaussians
33%
Thin Films
33%
Material Science
Film
100%
Physical Vapor Deposition
100%
Surface (Surface Science)
100%
Sputter Deposition
50%
Thin Film Morphology
50%
Chemical Engineering
Physical Vapor Deposition
100%
Film
100%
Sputter Deposition
33%