TY - JOUR
T1 - Role of Copper on Repassivation of Stainless Steel Pits
AU - Hariharan, Karthikeyan
AU - Guo, Xiaolei
AU - Srinivasan, Jayendran
AU - Frankel, Gerald S.
AU - Schindelholz, Eric J.
N1 - Publisher Copyright:
© 2023 The Author(s). Published on behalf of The Electrochemical Society by IOP Publishing Limited.
PY - 2023
Y1 - 2023
N2 - The effect of copper on the repassivation of pits in stainless steels was examined through potentiodynamic polarization of one-dimensional (1D) pits at two different downward scan rates for 17-4 PH stainless steel. Post-mortem characterization of tested 1D pits revealed that copper enriches on the pit surface, which most likely occurs through reduction of CuCl32− inside the pit during the downward potential scan. 1D diffusion analysis revealed significant amounts of copper replating can occur before the attainment of critical pit chemistry for repassivation when scanning at a high rate, which complicates repassivation potential (E rp) measurements. Copper replating may lead to higher value of measured E rp by, (i) reducing the measured net anodic current density, (ii) blocking the dissolution of stainless steel underneath the copper deposits, (iii) enhancing local hydrogen evolution kinetics to raise the pH of the pit bottom. The relative strength of the copper replating effect is controlled by scan rate or more generally, pit growth conditions and local pit chemistry. Implications of the copper replating effect on measuring a lower-bound value of repassivation potentials are discussed in light of existing repassivation potential measurement techniques. The pit growth conditions that could lead to copper replating in real pits are discussed.
AB - The effect of copper on the repassivation of pits in stainless steels was examined through potentiodynamic polarization of one-dimensional (1D) pits at two different downward scan rates for 17-4 PH stainless steel. Post-mortem characterization of tested 1D pits revealed that copper enriches on the pit surface, which most likely occurs through reduction of CuCl32− inside the pit during the downward potential scan. 1D diffusion analysis revealed significant amounts of copper replating can occur before the attainment of critical pit chemistry for repassivation when scanning at a high rate, which complicates repassivation potential (E rp) measurements. Copper replating may lead to higher value of measured E rp by, (i) reducing the measured net anodic current density, (ii) blocking the dissolution of stainless steel underneath the copper deposits, (iii) enhancing local hydrogen evolution kinetics to raise the pH of the pit bottom. The relative strength of the copper replating effect is controlled by scan rate or more generally, pit growth conditions and local pit chemistry. Implications of the copper replating effect on measuring a lower-bound value of repassivation potentials are discussed in light of existing repassivation potential measurement techniques. The pit growth conditions that could lead to copper replating in real pits are discussed.
UR - https://www.scopus.com/pages/publications/85165234012
UR - https://www.scopus.com/pages/publications/85165234012#tab=citedBy
U2 - 10.1149/1945-7111/ace339
DO - 10.1149/1945-7111/ace339
M3 - Article
AN - SCOPUS:85165234012
SN - 0013-4651
VL - 170
JO - Journal of the Electrochemical Society
JF - Journal of the Electrochemical Society
IS - 7
M1 - 071503
ER -