Re-evaluation of the slip correction parameter of certified PSL spheres using a nanometer differential mobility analyzer (NDMA)

Haesung Jung, George W. Mulholland, David Y.H. Pui, Jung Hyeun Kim

Research output: Contribution to journalArticlepeer-review

13 Scopus citations

Abstract

The slip correction parameter measured by Kim et al. (2005) is re-evaluated with the newly issued current smallest standard reference material SRM® 1964 (PSL 60.39nm). The same experimental method utilizing the electrical mobility technique under low pressure condition is used. From the measured peak voltages at low pressures down to 8.63kPa (Kn=81), slip correction factor (C) is calculated, and then the slip correction parameter (A) is obtained by nonlinear curve fitting. The parameter A is 1.165+0.480exp(-1.001/Kn) with the asymptotic value of 1.645 for the free molecular regime, which corresponds to a diffuse reflection fraction of 0.873. The value of A is at most 0.1% different from the value reported by Kim et al. (2005) 1.165+0.483exp(-0.997/Kn) and the uncertainty is reduced by about 0.5% to a value of about 1.5%.

Original languageEnglish (US)
Pages (from-to)24-34
Number of pages11
JournalJournal of Aerosol Science
Volume51
DOIs
StatePublished - Sep 2012

Keywords

  • Drag force
  • Electrical mobility
  • Electrospray
  • Free molecular regime
  • Low pressure system
  • Slip correction factor

Fingerprint Dive into the research topics of 'Re-evaluation of the slip correction parameter of certified PSL spheres using a nanometer differential mobility analyzer (NDMA)'. Together they form a unique fingerprint.

Cite this