Keyphrases
Protection Scheme
100%
Extreme Ultraviolet Lithography
100%
Low-pressure Environment
100%
Critical Failure Surface
100%
Particle Formation
42%
Particle Contamination
42%
Bottom Plate
42%
Temperature Gradient
28%
Thermophoresis
28%
Thermophoretic
28%
Gas Temperature
28%
Gas Molecules
28%
Nanoparticles
14%
Particle Size
14%
Condensation
14%
Process Development
14%
Gas Flow
14%
Particle System
14%
Temperature Measurement
14%
Wafer
14%
Pinhole
14%
Low-pressure Condition
14%
System Pressure
14%
Protection Efficiency
14%
Gap Distance
14%
Low Velocity
14%
Vacuum Chamber
14%
Vacuum System
14%
Initial Velocity
14%
Chamber Wall
14%
Surface Contamination
14%
Particle Speed
14%
Challenges for the Future
14%
Vacuum Pump
14%
Diffusional
14%
High Gas
14%
Protection Level
14%
Particle Behavior
14%
Thermophoretic Force
14%
Gravitational Settling
14%
Vacuum Environment
14%
EUV Mask
14%
Settling Speed
14%
Low-pressure Systems
14%
Engineering
Protection Scheme
100%
Extreme-Ultraviolet Lithography
100%
Bottom Plate
60%
Thermophoresis
40%
Gas Molecule
40%
Gas Temperature
40%
Thermal Gradient
40%
Temperature Gradients
40%
Nanoparticles
20%
Process Development
20%
System Pressure
20%
Pressure System
20%
Chamber Wall
20%
Gas Flow
20%
Gravitational Settling
20%
Initial Speed
20%
Surface Contamination
20%