Abstract
Understanding plasma-surface interactions in plasma etching, deposition, and cleaning is a prerequisite for achieving process goals. Attenuated total reflection Fourier transform infrared (ATR-FTIR) spectroscopy is a valuable surface-sensitive diagnostic technique that can be used in situ during plasma process development to detect adsorbed species on surfaces and to monitor the composition of thin films. This article briefly describes the ATR-FTIR technique, and summarizes selected results from silicon surface cleaning and plasma-enhanced chemical vapor deposition (PECVD).
| Original language | English (US) |
|---|---|
| Pages | 181-190 |
| Number of pages | 10 |
| Volume | 40 |
| No | 10 |
| Specialist publication | Solid State Technology |
| State | Published - Oct 1 1997 |