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Pressure dependent two-dimensional electron transport in defect doped InGaAs/InP heterostructures

  • D. Wasik
  • , L. Dmowski
  • , J. Mikucki
  • , J. Lusakowski
  • , L. Hsu
  • , W. Walukiewicz
  • , W. G. Bi
  • , C. W. Tu

Research output: Contribution to journalArticlepeer-review

Abstract

We have measured the transport properties of InGaAs/InP heterostructures where donor-like native defects incorporated in a low temperature grown InP barrier are used as a source of electrons. Conductance of such structures shows comparable contributions from low mobility electrons in the InP barrier and from the two-dimensional electron gas (2DEG) at the heterostructure interface. We used high hydrostatic pressure to eliminate the low mobility conductance and were able to determine the parameters of two-dimensional electron gas. We find that the highest two-dimensional electron mobility of 3 × 104 cm2/Vs is determined by the scattering from the background ionized impurities located in the InGaAs quantum well.

Original languageEnglish (US)
Pages (from-to)813-818
Number of pages6
JournalMaterials Science Forum
Volume258-263
Issue numberPART 2
DOIs
StatePublished - 1997

Keywords

  • Heterostructure
  • InGaAs
  • InP
  • Pressure

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