Preparation of Y2Ba4Cu8O20-x thin films by thermal coevaporation

D. D. Berkley; D. H. Kim; B. R. Johnson; A. M. Goldman; M. L. Mecartney; K. Beauchamp; J. Maps

doi:10.1063/1.100556

Preparation of Y₂Ba₄Cu₈O_20-x thin films by thermal coevaporation

D. D. Berkley
, D. H. Kim
, B. R. Johnson
, A. M. Goldman
, M. L. Mecartney
, K. Beauchamp
, J. Maps

Research output: Contribution to journal › Article › peer-review

17 Scopus citations

Abstract

We report on the preparation of Y₂Ba₄Cu ₈O_20-x ("248") thin films by coevaporation using a combination of electron beam and Knudsen cell vapor sources. Our best film shows a superconducting onset at 80 K and zero resistance at 72 K. The x-ray diffraction patterns show nearly single phase "248" with a small YBa ₂Cu₃O_7-x ("123") impurity. It has been our experience that films can be annealed at least twice without displaying any shift in diffraction peak position.

Original language	English (US)
Pages (from-to)	708-709
Number of pages	2
Journal	Applied Physics Letters
Volume	53
Issue number	8
DOIs	https://doi.org/10.1063/1.100556
State	Published - 1988

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Copyright 2008 Elsevier B.V., All rights reserved.

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10.1063/1.100556

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@article{b19d21d785c548aba7910cc7e34f390e,

title = "Preparation of Y2Ba4Cu8O20-x thin films by thermal coevaporation",

abstract = "We report on the preparation of Y2Ba4Cu 8O20-x ({"}248{"}) thin films by coevaporation using a combination of electron beam and Knudsen cell vapor sources. Our best film shows a superconducting onset at 80 K and zero resistance at 72 K. The x-ray diffraction patterns show nearly single phase {"}248{"} with a small YBa 2Cu3O7-x ({"}123{"}) impurity. It has been our experience that films can be annealed at least twice without displaying any shift in diffraction peak position.",

author = "Berkley, \{D. D.\} and Kim, \{D. H.\} and Johnson, \{B. R.\} and Goldman, \{A. M.\} and Mecartney, \{M. L.\} and K. Beauchamp and J. Maps",

year = "1988",

doi = "10.1063/1.100556",

language = "English (US)",

volume = "53",

pages = "708--709",

journal = "Applied Physics Letters",

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T1 - Preparation of Y2Ba4Cu8O20-x thin films by thermal coevaporation

AU - Berkley, D. D.

AU - Kim, D. H.

AU - Johnson, B. R.

AU - Goldman, A. M.

AU - Mecartney, M. L.

AU - Beauchamp, K.

AU - Maps, J.

PY - 1988

Y1 - 1988

N2 - We report on the preparation of Y2Ba4Cu 8O20-x ("248") thin films by coevaporation using a combination of electron beam and Knudsen cell vapor sources. Our best film shows a superconducting onset at 80 K and zero resistance at 72 K. The x-ray diffraction patterns show nearly single phase "248" with a small YBa 2Cu3O7-x ("123") impurity. It has been our experience that films can be annealed at least twice without displaying any shift in diffraction peak position.

AB - We report on the preparation of Y2Ba4Cu 8O20-x ("248") thin films by coevaporation using a combination of electron beam and Knudsen cell vapor sources. Our best film shows a superconducting onset at 80 K and zero resistance at 72 K. The x-ray diffraction patterns show nearly single phase "248" with a small YBa 2Cu3O7-x ("123") impurity. It has been our experience that films can be annealed at least twice without displaying any shift in diffraction peak position.

UR - https://www.scopus.com/pages/publications/2842592011

UR - https://www.scopus.com/pages/publications/2842592011#tab=citedBy

U2 - 10.1063/1.100556

DO - 10.1063/1.100556

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SN - 0003-6951

VL - 53

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EP - 709

JO - Applied Physics Letters

JF - Applied Physics Letters

IS - 8

ER -